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1,1-bis-(4-hydroxy-phenyl)-1-p-tolyl-ethane | 109263-71-0

中文名称
——
中文别名
——
英文名称
1,1-bis-(4-hydroxy-phenyl)-1-p-tolyl-ethane
英文别名
1,1-Bis-(4-hydroxy-phenyl)-1-p-tolyl-aethan;4-(1-(4-hydroxyphenyl)-1-(4-methylphenyl)ethyl)phenol;4,4'-(1-(p-Tolyl)ethane-1,1-diyl)diphenol;4-[1-(4-hydroxyphenyl)-1-(4-methylphenyl)ethyl]phenol
1,1-bis-(4-hydroxy-phenyl)-1-<i>p</i>-tolyl-ethane化学式
CAS
109263-71-0
化学式
C21H20O2
mdl
——
分子量
304.389
InChiKey
SJIOLQHISSFFFP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    133 °C
  • 沸点:
    487.0±40.0 °C(Predicted)
  • 密度:
    1.159±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    4.8
  • 重原子数:
    23
  • 可旋转键数:
    3
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

点击查看最新优质反应信息

文献信息

  • COMPOSITIONS AND METHODS FOR STORING HOLOGRAPHIC DATA
    申请人:Erben Christoph Georg
    公开号:US20090082580A1
    公开(公告)日:2009-03-26
    In one aspect, the present invention provides a novel thiophene-containing polynitrone compound having structure (II) wherein R 1 is independently at each occurrence a C 1 -C 20 aliphatic radical, a C 3 -C 20 cycloaliphatic radical, or a C 2 -C 30 aromatic radical; R 2 is independently at each occurrence hydrogen, deuterium, a C 1 -C 20 aliphatic radical, a C 3 -C 20 cycloaliphatic radical, or a C 2 -C 30 aromatic radical; and “a” is an integer from 2 to 4.
    在一个方面,本发明提供了一种具有结构(II)的新型含噻吩的多硝酮化合物,其中R1在每次出现时独立地是C1-C20脂肪基、C3-C20环脂基或C2-C30芳香基;R2在每次出现时独立地是氢、氘、C1-C20脂肪基、C3-C20环脂基或C2-C30芳香基;“a”是从2到4的整数。
  • NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF
    申请人:Reddy Vummadi Venkat
    公开号:US20100081084A1
    公开(公告)日:2010-04-01
    The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.
    本发明提供了新型二氮基萘醌磺酸双酚衍生物。更具体地说,本发明涉及包括碱溶性树脂、光敏化合物和表面活性剂的光敏涂层。制备的光刻膜厚度小于1微米。光敏化合物在水性碱性溶液中可溶或可膨胀,是一般式(A)中的二氮基萘醌磺酸双酚酯,其中DNQ代表2-二氮基-1-萘醌-4-磺酰基、2-二氮基-1-萘醌-5-磺酰基、1-二氮基-2-萘醌-4-磺酰基基团,R1代表烷基、芳基和取代芳基基团。本发明还提供了一种涂覆和成像光敏组合物的方法。
  • Vinylphenyl compound, process for the production thereof, polymerizable composition containing same, and crosslinked polymer formed therefrom
    申请人:TOKUYAMA SODA KABUSHIKI KAISHA
    公开号:EP0415729A2
    公开(公告)日:1991-03-06
    Novel vinylphenyl compound which gives, as a copolymer with other vinyl compound copolymerizable therewith, a crosslinked polymer excellent in birefringence, transparency, heat resistance and moisture absorption resistance. The crosslinked polymer is advantageously useful as a disk substrate.
    新颖的乙烯基苯基化合物,与其他可与之共聚的乙烯基化合物共聚后,可产生一种在双折射、透明度、耐热性和吸湿性方面都非常出色的交联聚合物。这种交联聚合物可用作磁盘衬底。
  • Flame retardant composition of polyerstercarbonate, halogenated polycarbonate, potassium diphenylsulfone sulfonate and polytetrafluoroethylene
    申请人:GENERAL ELECTRIC COMPANY
    公开号:EP0838503A1
    公开(公告)日:1998-04-29
    A polyestercarbonate copolymer blend which exhibits a glass transition temperature lower than bisphenol-A carbonate homopolymer, shows good processability and fire-retardancy. The desired lower Tg and improved flow can be achieved by the polycondensation of a dihydric phenol and aliphatic dicarboxylic acid. The condensate is polymerized with a carbonate forming reagent. The resin is fire-retarded with a mixture of halogenated polycarbonate, potassium diphenylsulfone sulfonate and polytetrafluoroethylene.
    一种聚酯碳酸酯共聚物混合物的玻璃化转变温度低于双酚 A 碳酸酯均聚物,具有良好的加工性和阻燃性。通过二元苯酚和脂肪族二羧酸的缩聚,可以达到所需的较低 Tg 值并改善流动性。缩合物与碳酸盐形成试剂聚合。用卤化聚碳酸酯、二苯基砜磺酸钾和聚四氟乙烯的混合物对树脂进行阻燃处理。
  • Polyurethanes prepared from oligomeric polyol compositions and polyisocyanates
    申请人:Presidium USA, Inc
    公开号:US11072679B2
    公开(公告)日:2021-07-27
    There is provided an oligomeric polyol composition having (a) an oligomeric network containing residues of at least one polyhydroxylated aromatic compound and residues of at least one polyol having at least three hydroxyl groups; and (b) a plurality of peripheral groups having one or more pendant hydroxyl groups bound to the oligomeric network by a plurality of linking units. The residues of the polyol may optionally contain one or more oxygen ether groups, one or more amino ether groups, or both of one or more oxygen ether groups and one or more amino ether groups. Reaction of the oligomeric polyols with isocyanate monomers affords a new class of polyurethanes having superior heat and water resistance. The new polyurethanes exhibit lower peak exotherms, typically less than 250° F. during in-mold polymerization. Articles prepared from polyurethanes incorporating such oligomeric polyol compositions exhibit flexural strengths and moduli in excess of 10,000 psi and 400,000 psi respectively, and outstanding green strength.
    本发明提供了一种低聚多元醇组合物,该组合物具有:(a) 低聚网络,其中包含至少一种多羟基芳香族化合物的残留物和至少一种具有至少三个羟基的多元醇的残留物;以及(b) 多个外围基团,这些外围基团具有一个或多个通过多个连接单元与低聚网络结合的垂羟基。多元醇的残基可选择含有一个或多个氧醚基团、一个或多个氨基醚基团,或同时含有一个或多个氧醚基团和一个或多个氨基醚基团。低聚多元醇与异氰酸酯单体反应可产生一类新型聚氨酯,具有优异的耐热性和耐水性。这种新型聚氨酯的放热峰值较低,模内聚合时通常低于 250°F。用含有此类低聚多元醇组合物的聚氨酯制备的物品,其抗弯强度和模量分别超过 10,000 psi 和 400,000 psi,并且具有出色的绿色强度。
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