(hexyloxy)dimethylphenylsilane

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 英文名称: (hexyloxy)dimethylphenylsilane
• 英文别名: dimethyphenylhexyloxysilane；1-Dimethyl(phenyl)silyloxyhexane；hexoxy-dimethyl-phenylsilane
• 化学式: C₁₄H₂₄OSi
• 分子量: 236.429
• InChiKey: VUGFQFUPEUNQGW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  16
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  二甲基苯基硅烷 、 正己醇 在 fibrous nanosilica(KCC-1) functionalized with 3-aminopropyltriethoxysilane supported Au(0.05percent) nanoparticle 作用下， 以 四氢呋喃 为溶剂， 反应 24.0h， 生成 (hexyloxy)dimethylphenylsilane
  参考文献：
  名称：

  有机硅烷氧化使用支持超小的纳米粒子和金准单原子纳米二氧化硅纤维半百万的营业额数† ‡

  摘要：

  超小纳米粒子和金（Au）的假单原子以及被3-氨基丙基三乙氧基硅烷（APTS）官能化的纤维纳米二氧化硅（KCC-1）的组合，可以设计出具有非常高周转率（TONs）的KCC-1-APTS / Au纳米催化剂）。KCC-1-APTS / Au催化的有机硅烷氧化为硅烷醇，其TON约为50万（二甲基苯基硅烷为模型底物为591 000）。此外，品质因数（FOM）提供了633 mmol h -1 K -1的反应速率，所需能量，反应规模和催化剂的可回收性的综合视图。。KCC-1-APTS / Au还催化了另外两个具有挑战性的反应，即具有很高TON的硅烷的醇解和醛的氢化硅烷化。这些特性使KCC-1-APTS / Au成为一种多功能的纳米催化剂。

  DOI：

  10.1039/c6ta09434a

文献信息

• Activation of silanes by Grubbs’ carbene complex Cl2(PCy3)2RuCHPh: dehydrogenative condensation of alcohols and hydrosilylation of carbonyls
  作者：Sarah V Maifeld、Reagan L Miller、Daesung Lee

  DOI：10.1016/s0040-4039(02)01385-0

  日期：2002.9

  This manuscript describes two catalytic methods for silyl ether synthesis using Grubbs’ catalyst Cl2(PCy3)2RuCHPh. Silyl ethers are obtained from the reaction of a variety of silanes with alcohols by dehydrogenative condensation and by the hydrosilylation of carbonyl compounds. Both reactions occur under neat conditions.

  这个手稿描述了使用Grubbs催化剂Cl作为甲硅烷基醚的合成两个催化方法2（PCY 3）2 RuCHPh。甲硅烷基醚是由各种硅烷与醇通过脱氢缩合反应和羰基化合物的氢化硅烷化反应制得的。两种反应均在纯净条件下发生。
• Coexistence of Cu(<scp>ii</scp>) and Cu(<scp>i</scp>) in Cu ion-doped zeolitic imidazolate frameworks (ZIF-8) for the dehydrogenative coupling of silanes with alcohols
  作者：Yan Dai、Peng Xing、Xiaoqin Cui、Zhihong Li、Xianming Zhang

  DOI：10.1039/c9dt03181b

  日期：——

  Recently, metal-ion-doped zeolitic imidazolate frameworks have gained considerable attention for their structure tailorability and potential catalytic applications. Herein, Cu ion-doped ZIF-8 nanocrystals were successfully prepared by the mechanical grinding of Cu(NO3)2, ZnO and 2-methylimidazole (HMeIM) using ethanol as an additive. In contrast to the general view that only Cu(II) is present in Cu-doped

  最近，金属离子掺杂的咪唑沸石骨架因其结构的可调节性和潜在的催化应用而受到了广泛的关注。在此，通过使用乙醇作为添加剂对Cu（NO 3）2，ZnO和2-甲基咪唑（HMeIM）进行机械研磨，成功制备了Cu离子掺杂的ZIF-8纳米晶体。与一般的观点相反，在掺Cu的ZIF-8中仅存在Cu（II），我们发现这种材料中Cu（II）和Cu（I）共存，这受到XPS和X射线诱导的支持。俄歇电子能谱（XAES）表征。此外，乙醇可能已起还原剂的作用，诱导了Cu（II）。由于Cu离子的混合价，掺杂Cu离子的ZIF-8纳米晶体在硅烷与醇的脱氢偶联中表现出优异的催化性能。
• Dioxomolybdenum(<scp>vi</scp>) complexes as catalysts for the hydrosilylation of aldehydes and ketones
  作者：Patrícia M. Reis、Carlos C. Romão、Beatriz Royo

  DOI：10.1039/b514930d

  日期：——

  The dioxomolybdenum(VI) complexes [MoO2Cl2] (1), [MoO2(acac)2] (2), [MoO2(S2CNEt2)2] (3), [CpMoO2Cl] (4), [MoO2(mes)2] (5) and the polymeric organotin-oxomolybdates [(R3Sn)2MoO4] [R = n-Bu (6), t-Bu (7), Me (8)] were examined as catalysts for the hydrosilylation of aldehydes and ketones with dimethylphenylsilane. Of these, [MoO2Cl2] (1) was the most efficient catalyst, affording quantitative yields

  二氧钼（VI）络合物[MoO 2 Cl 2 ]（1），[MoO 2（acac）2 ]（2），[MoO 2（S 2 CNEt 2）2 ]（3），[CpMoO 2 Cl]（4），[MoO 2（mes）2 ]（5）和聚合的有机锡-氧钼酸盐[[R 3 Sn）2 MoO 4 ] [R = n -Bu（6），t -Bu（7），Me（8）]作为醛和酮与二甲基苯基硅烷的硅氢加成反应的催化剂。其中，[MoO 2 Cl 2 ]（1）是最有效的催化剂，在室温下可在乙腈中定量获得相应的甲硅烷基化醚。复合物2，4-8也催化相同的反应，但所需的加热在80℃下和较长的反应时间相比1。化合物3是不活泼的。氧化钼介导的硅氢加成反应的广泛范围涉及各种醛类和酮类。直观地讲，1的活动在NCMe中最高。在没有羰基底物的情况下，[MoO2 Cl 2（NCBu t）]（ 10）与HSiMe 2 Ph反应，得到[MoO（OSiMe 2 Ph）Cl
• Reaction of Silyl Hydrides with Tetrabutoxygermanium in the Presence of B(C₆F₅)₃: Difference between Silicon and Germanium Chemistries and Easy Route to GeH₄
  作者：Slawomir Rubinsztajn、Marek Cypryk、Julian Chojnowski、Witold Fortuniak、Urszula Mizerska、Piotr Pospiech

  DOI：10.1021/acs.organomet.8b00156

  日期：2018.5.29

  Dehydrocarbonative condensation reaction between alkoxysilanes and hydrosilanes catalyzed by tris(pentafluorophenyl)borane has been widely used for the formation of siloxane bonds. Our attempt to extend this chemistry to the preparation of Ge–O–Si bonds produced an unexpected outcome. The reaction of Ge(OBu)4 with PhMe2SiH in the presence of a catalytic amount of B(C6F5)3 at room temperature proceeded

  三（五氟苯基）硼烷催化的烷氧基硅烷与氢硅烷之间的脱烃缩合反应已广泛用于硅氧烷键的形成。我们将这种化学方法扩展到制备Ge–O–Si键的尝试产生了意想不到的结果。在室温下催化量的B（C 6 F 5）3存在下，Ge（OBu）4与PhMe 2 SiH的反应顺利进行，反应物完全消耗，形成GeH 4和PhMe 2SiOBu高产。我们首次实现了Ge-OR和Si-H之间官能团的选择性交换。发现的反应具有简单的反应条件，可用于从容易获得的安全底物原位制备GeH 4。
• An Efficient Solvent-Free Route to Silyl Esters and Silyl Ethers
  作者：Yuko Ojima、Kazuya Yamaguchi、Noritaka Mizuno

  DOI：10.1002/adsc.200900230

  日期：2009.6

  Abstractmagnified imageDinuclear metal complexes, especially (p‐cymene)ruthenium dichloride dimer [RuCl2(p‐cymene)]2}, have been found to exhibit high catalytic performance for the dehydrosilylation of various kinds of carboxylic acids and alcohols. The dehydrosilylation with [RuCl2(p‐cymene)]2 proceeded efficiently with only one equivalent of silane with respect to substrate (carboxylic acids or alcohols) under solvent‐free conditions to give the corresponding silyl esters and ethers in excellent yields with a high turnover number (TON) and frequency (TOF). The 1H NMR spectrum of a toluene‐d8 solution of [RuCl2(p‐cymene)]2 and a silane showed a signal assignable to the ruthenium hydride species. In contrast, no new signals were detected in the 1H NMR spectrum of a toluene‐d8 solution of [RuCl2(p‐cymene)]2 and a carboxylic acid or an alcohol. Therefore, the ruthenium metal in [RuCl2(p‐cymene)]2 activates a silane to afford the hydride intermediate, possibly a silylmetal hydride species. Then, the nucleophilic attack of a substrate (carboxylic acid or alcohol) to the hydride intermediate proceeds to give the corresponding silylated product. The present dehydrosilylation with an optically active silane proceeded exclusively under inversion of stereochemistry at the chiral silicon center, suggesting that the nucleophilic attack of a substrate to the hydride intermediate occurs from the backside of the ruthenium‐silicon bond.