Photolysis of heptamethyl-2-phenyltrisilane and octamethyl-2,3-diphenyltetrasilane in the presence of dimethyl sulfoxide
作者:Hiroshige Okinoshima、William P. Weber
DOI:10.1016/s0022-328x(00)93288-1
日期:1978.8
Photolysis of heptamethyl-2-phenyltrisilane and of octamethyl-2,3-diphenyltetrasilane in the presence of dimethyl sulfoxide (DMSO) occurs by two major pathways. The first involves loss of methylphenylsilylene, which reacts with DMSO to yield methylphenylsilanone and dimethyl sulfide. Methylphenylsilanone has been trapped by reaction with hexamethylcyclotrisiloxane (VII) to yield heptamethylphenylcyclotetrasiloxane
在二甲基亚砜(DMSO)存在下,七甲基-2-苯基三硅烷和八甲基-2,3-二苯基四硅烷的光解发生通过两个主要途径。第一个涉及甲基苯基亚甲硅的损失,该甲基苯基亚甲硅与DMSO反应生成甲基苯基硅酮和二甲基硫醚。甲基苯基硅酮已通过与六甲基环三硅氧烷(VII)反应生成七甲基苯基环四硅氧烷和1,1,3,3-四甲基-2-氧杂-1,3-二硅环戊烷(XIII)反应生成1,1,3,5,5-五甲基-3-苯基-2,4-二氧代-1,3,5-三硅杂环庚烷。第二种途径涉及DMSO的氧对苯基取代的硅原子的亲核攻击,导致苯基迁移至相邻的硅原子,并形成甲基(三甲基甲硅烷基)硅酮和二甲基硫醚。通过与反应生成七甲基(三甲基硅烷基)环四硅氧烷,通过XIII生成1,1,3,5,5-五甲基-3-三甲基硅烷基-2,4-二氧杂-1,3,从而捕获了甲基(三甲基硅烷基)硅酮。 5-三硅环庚烷。考虑了这些反应的可能机制。