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Bis(2-methoxybutylperoxy) carbonate

中文名称
——
中文别名
——
英文名称
Bis(2-methoxybutylperoxy) carbonate
英文别名
bis(2-methoxybutylperoxy) carbonate
Bis(2-methoxybutylperoxy) carbonate化学式
CAS
——
化学式
C11H22O9
mdl
——
分子量
298.29
InChiKey
NCDGAXZQOGPZFX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.3
  • 重原子数:
    20
  • 可旋转键数:
    14
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.91
  • 拓扑面积:
    90.9
  • 氢给体数:
    0
  • 氢受体数:
    9

文献信息

  • ANTI-REFLECTIVE FIM COMPRISING AN MALEIMIDE-COPOLYMER BASED INTERMEDIATE LAYER
    申请人:Canon Kabushiki Kaisha
    公开号:EP2906972A2
    公开(公告)日:2015-08-19
  • OPTICAL MEMBER COMPRISING A LAMINATED BODY WITH POLYMER LAYER CONTAINING A MALEIMIDE COPOLYMER AND METHOD FOR MANUFACTURING THE SAME
    申请人:Canon Kabushiki Kaisha
    公开号:EP2906972B1
    公开(公告)日:2017-07-05
  • OPTICAL MEMBER AND METHOD FOR MANUFACTURING THE SAME
    申请人:CANON KABUSHIKI KAISHA
    公开号:US20150316691A1
    公开(公告)日:2015-11-05
    This invention provides an optical member having a high antireflection effect also on a base material with a low refractive index. This invention relate to an optical member in which a laminated body is formed on a base material surface, in which the laminated body has a porous layer or a layer having an uneven structure on the surface and having a polymer layer has a thickness of 10 nm or more and 150 nm or less and containing a maleimide copolymer between the porous layer or the layer having an uneven structure and the base material.
  • FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD
    申请人:JSR CORPORATION
    公开号:US20190025699A1
    公开(公告)日:2019-01-24
    A film-forming material for a resist process includes: a siloxane polymer component including at least two selected from the group consisting of a sulfur atom, a nitrogen atom, a boron atom and a phosphorus atom; and organic solvent. The siloxane polymer component preferably has a formulation represented by formula (1). R 1 represents a monovalent organic group comprising at least one of a sulfur atom and a nitrogen atom. R 2 represents a monovalent organic group comprising at least one of a sulfur atom and a nitrogen atom, a hydrogen atom, a hydroxy group, or a substituted or unsubstituted hydrocarbon group having 1 to 20 carbon atoms. A pattern-forming method includes: applying the film-forming material for a resist process onto a substrate to form a silicon-containing film; forming a pattern using the silicon-containing film as a mask; and removing the silicon-containing film.
  • [EN] OPTICAL MEMBER AND METHOD FOR MANUFACTURING THE SAME<br/>[FR] ÉLÉMENT OPTIQUE ET SON PROCÉDÉ DE FABRICATION
    申请人:CANON KK
    公开号:WO2014084328A2
    公开(公告)日:2014-06-05
    This invention provides an optical member having a high antireflection effect also on a base material with a low refractive index. This invention relate to an optical member in which a laminated body is formed on a base material surface, in which the laminated body has a porous layer or a layer having an uneven structure on the surface and having a polymer layer has a thickness of 10 nm or more and 150 nm or less and containing a maleimide copolymer between the porous layer or the layer having an uneven structure and the base material.
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