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7-Thiabicyclo<4.2.0>octan | 278-40-0

中文名称
——
中文别名
——
英文名称
7-Thiabicyclo<4.2.0>octan
英文别名
7-Thiabicyclo[4.2.0]octane;7-thiabicyclo[4.2.0]octane
7-Thiabicyclo<4.2.0>octan化学式
CAS
278-40-0
化学式
C7H12S
mdl
——
分子量
128.238
InChiKey
WFEQSHOAZUJHJV-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.4
  • 重原子数:
    8
  • 可旋转键数:
    0
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    25.3
  • 氢给体数:
    0
  • 氢受体数:
    1

文献信息

  • [EN] MONOBACTAMS AND METHODS OF THEIR SYNTHESIS AND USE<br/>[FR] MONOBACTAMES ET PROCÉDÉS DE SYNTHÈSE ET D'UTILISATION DE CES DERNIERS
    申请人:HARVARD COLLEGE
    公开号:WO2015103583A1
    公开(公告)日:2015-07-09
    Described herein are monobactam antibiotics of Formula (I), (Ι'), (II), and (II'), along with methods and intermediates for preparing these compounds. Pharmaceutical compositions and methods of treating infectious diseases using the monobactams are also provided.
    本文描述了单环内酰胺抗生素的化学式(I)、(Ι')、(II)和(II'),以及制备这些化合物的方法和中间体。还提供了使用单环内酰胺治疗传染病的药物组合物和方法。
  • ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN
    申请人:FUJIFILM Corporation
    公开号:US20140242502A1
    公开(公告)日:2014-08-28
    According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
  • MONOBACTAMS AND METHODS OF THEIR SYNTHESIS AND USE
    申请人:PRESIDENT AND FELLOWS OF HARVARD COLLEGE
    公开号:US20160326157A1
    公开(公告)日:2016-11-10
    Described herein are monobactam antibiotics of Formula (I), (I′), (II), and (II′), along with methods and intermediates for preparing these compounds. Pharmaceutical compositions and methods of treating infectious diseases using the monobactams are also provided.
  • SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION
    申请人:FUJIFILM Corporation
    公开号:US20170005266A1
    公开(公告)日:2017-01-05
    Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB). In General Formula (IA), R 1a represents a hydrogen atom, a halogen atom, or an alkyl group. L 1a and L 2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other, m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L 2a -(X) m2a )'s may be the same or different from each other. In General Formula (IB), R 1b represents a hydrogen atom, a halogen atom, or an alkyl group. L 1b represents a single bond or a linking group, and Ar 1b represents an aromatic ring, m1b represents an integer of 1 to 5.
  • SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION
    申请人:FUJIFILM Corporation
    公开号:US20170054076A1
    公开(公告)日:2017-02-23
    Provided is a semiconductor device which includes a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound that has a repeating unit (IA) represented by the following Formula (IA) and a repeating unit (IB) represented by the following Formula (IB); and an insulating layer-forming composition which is used for forming an insulating layer of a semiconductor device and contains a polymer compound that has the following repeating units (IA) and (IB). In Formulae, R 1a and R 1b each independently represent a hydrogen atom, a halogen atom, or an alkyl group. L 1a , L 2a , and L 1b each independently represent a single bond or a linking group. X represents a crosslinkable group and Y B represents a decomposable group or a hydrogen atom. m1a and m2a each independently represent an integer of 1 to 5. The symbol “*” represents a bonding position of the repeating units.
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