申请人:Hoechst-Roussel Pharmaceuticals, Inc.
公开号:US04826846A1
公开(公告)日:1989-05-02
There are disclosed compounds of the formula ##STR1## wherein the group A is ##STR2## where R.sub.1 and R.sub.2 are each independently or loweralkyl, or R.sub.1 +R.sub.2 =(CH.sub.2).sub.m, m being 2 to 6, p is 1 or 2, and each X is independently hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, nitro, amino, loweralkylamino, diloweralkylamino, trifluoromethyl or loweralkylthio; W is O, H.sub.2 or [H, OH]; n is 2, 3 or 4; and R.sub.3 is ##STR3## where q is 1 or 2 and each Y is independently hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, nitro, amino, loweralkylamino, diloweralkylamino, triflouromethyl or loweralkylthio, which are useful as antipsychotic, anxiolytic and analgesic agents.
公开了式子为##STR1##的化合物,其中A基团为##STR2##,其中R.sub.1和R.sub.2各自独立地为较低烷基,或R.sub.1 +R.sub.2 =(CH.sub.2).sub.m,m为2到6,p为1或2,每个X独立地为氢、较低烷基、较低烷氧基、卤素、羟基、硝基、氨基、较低烷基氨基、二较低烷基氨基、三氟甲基或较低烷基硫基; W为O,H.sub.2或[H,OH];n为2、3或4; R.sub.3为##STR3##,其中q为1或2,每个Y独立地为氢、较低烷基、较低烷氧基、卤素、羟基、硝基、氨基、较低烷基氨基、二较低烷基氨基、三氟甲基或较低烷基硫基,这些化合物可用作抗精神病、抗焦虑和镇痛剂。