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2-(methylsulfonyl)ethyl acetate | 92543-10-7

中文名称
——
中文别名
——
英文名称
2-(methylsulfonyl)ethyl acetate
英文别名
acetic acid-(2-methanesulfonyl-ethyl ester);Essigsaeure-(2-methansulfonyl-aethylester);Acetic acid 2-methanesulfonyl-ethyl ester;2-methylsulfonylethyl acetate
2-(methylsulfonyl)ethyl acetate化学式
CAS
92543-10-7
化学式
C5H10O4S
mdl
MFCD25969074
分子量
166.198
InChiKey
RGCIACOELZRWMQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -0.5
  • 重原子数:
    10
  • 可旋转键数:
    4
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.8
  • 拓扑面积:
    68.8
  • 氢给体数:
    0
  • 氢受体数:
    4

反应信息

  • 作为反应物:
    参考文献:
    名称:
    Preparation of vinyl sulfones
    摘要:
    公开号:
    US02474808A1
  • 作为产物:
    描述:
    2-羟乙基甲砜乙酸酐硫酸 作用下, 反应 1.0h, 以48%的产率得到2-(methylsulfonyl)ethyl acetate
    参考文献:
    名称:
    Effects of volume and surface property in hydrolysis by acetylcholinesterase. The trimethyl site
    摘要:
    beta-Substituted ethyl acetates, XCH2CH2OCOCH3, have been prepared, and their hydrolysis by acetylcholinesterase has been studied. Log of enzymic reactivity, normalized for intrinsic reactivity in hydrolysis by hydroxide, log (kcat/Km)n, rises linearly with increasing refraction volume, MR (or RD25), for substrates with beta-X = H, Cl, Br, CH3CH2, (CH3)2CH, (CH3)2S+, (CH3)3N+, and (CH3)3C. Larger substituents may be accommodated, (CH3)3Si and (CH3CH2)3N+, with no further increase in rate. Substrates with beta-substituents CH3S, CH3S(O), (CH3)3N+(OH), and CH3S(O2) are less reactive than consistent with the relation with MR by factors of 5-40, indicating that hydrophobic surface and desolvation of the substrate--enzyme interface may be necessary for maximum reactivity correlated with MR. Values of log (kcat/Km)n for substrates with beta-substituents X = CH3S, Cl, Br, CH3CH2, (CH3)2CH, (CH3)3C, and (CH3)3Si rise linearly with increasing hydrophobicity, pi, but reactivity of substrates with X = (CH3)3N+ and (CH3)2S+ are more reactive than consistent with a relation to pi by factors of 300 and 40 and with X = CH3S(O2), CH3S(O), and (CH3)2N+(OH), by factors of 7-100. Reactivity appears related to (i) volume of the beta-substituent and its fit in its subsite, which is trimethyl rather than anionic, and (ii) the hydrophobicity of its surface.
    DOI:
    10.1021/jm00378a020
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文献信息

  • Preparation of vinyl sulfones
    申请人:US RUBBER CO
    公开号:US02474808A1
    公开(公告)日:1949-07-05
  • Effects of volume and surface property in hydrolysis by acetylcholinesterase. The trimethyl site
    作者:Saul G. Cohen、Jerome L. Elkind、S. Bano Chishti、Jose L. Giner、Heide Reese
    DOI:10.1021/jm00378a020
    日期:1984.12
    beta-Substituted ethyl acetates, XCH2CH2OCOCH3, have been prepared, and their hydrolysis by acetylcholinesterase has been studied. Log of enzymic reactivity, normalized for intrinsic reactivity in hydrolysis by hydroxide, log (kcat/Km)n, rises linearly with increasing refraction volume, MR (or RD25), for substrates with beta-X = H, Cl, Br, CH3CH2, (CH3)2CH, (CH3)2S+, (CH3)3N+, and (CH3)3C. Larger substituents may be accommodated, (CH3)3Si and (CH3CH2)3N+, with no further increase in rate. Substrates with beta-substituents CH3S, CH3S(O), (CH3)3N+(OH), and CH3S(O2) are less reactive than consistent with the relation with MR by factors of 5-40, indicating that hydrophobic surface and desolvation of the substrate--enzyme interface may be necessary for maximum reactivity correlated with MR. Values of log (kcat/Km)n for substrates with beta-substituents X = CH3S, Cl, Br, CH3CH2, (CH3)2CH, (CH3)3C, and (CH3)3Si rise linearly with increasing hydrophobicity, pi, but reactivity of substrates with X = (CH3)3N+ and (CH3)2S+ are more reactive than consistent with a relation to pi by factors of 300 and 40 and with X = CH3S(O2), CH3S(O), and (CH3)2N+(OH), by factors of 7-100. Reactivity appears related to (i) volume of the beta-substituent and its fit in its subsite, which is trimethyl rather than anionic, and (ii) the hydrophobicity of its surface.
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