4-[bis(2-methyl-4-hydroxy-5-cyclohexylphenyl)methyl]-1,2-dihydroxybenzene | 160545-17-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4-[bis(2-methyl-4-hydroxy-5-cyclohexylphenyl)methyl]-1,2-dihydroxybenzene
• 英文别名: 4-[bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)methyl]-1,2-dihydroxybenzene；5,5'-dicyclohexyl-4,4',3'',4''-tetrahydroxy-2,2'-dimethyltriphenylmethane；bis(5-cyclohexanyl-4-hydroxy-2-methylbenzenyl)-3,4-dihydroxyphenylmethane；4-[bis(3-cyclohexyl-4-hydroxymono-6-methylphenyl)methyl]-1,2-benzenediol；4-[di(2-methyl-4-hydroxy-5-cyclohexylphenyl)methyl]-1,2-dihydroxybenzene；4-[bis(3-cyclohexaneyl-4-hydroxy-6-methylphenyl)methyl]-1,2-benzenediol；4-[bis(3-cyclohexyl-4-hydroxy-6-methaneylphenyl)methyl]-1,2-benzenediol；bis(3-cyclohexyl-4-hydroxy-6-methylbenzenyl)-3,4-dihydroxyphenylmethane；bis(5-cyclohexyl-4-hydroxy-2-methylbenzenyl)-3,4-dihydroxyphenylmethane；di(3-cyclohexyl-4-hydroxy-6-methaneylphenyl)-3,4-dihydroxyphenylmethane；4-[bis(3-cyclohexyl-4-hydroxy-6-methylbenzenyl)methyl]-1,2-benzenediol；bis(4-hydroxy-5-cyclohexyl-2-methylphenyl)(3,4-dihydroxyphenyl)methane；4,4'-[(3,4-dihydroxyphenyl)methylene]bis(2-cyclohexyl-5-methylphenol)；4-[di(3-cyclohexyl-4-hydroxy-6-methylbenzenyl)methyl]-1,2-benzenediol；bis(2-methyl-4-hydroxy-5-cyclohexylphenyl)-3,4-dihydroxyphenylmethane；bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenylmethane；bis(4-hydroxy-2-methyl-5-cyclohexylphenyl)-3,4-dihydroxyphenylmethane；bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)-3,4-dihydroxyphenylmethane；4-(bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)methyl)benzene-1,2-diol；4-[bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)methyl]-1,2-benzenediol；di(2-methyl-4-hydroxy-5-cyclohexylphenyl)-3,4-dihydroxyphenylmethane；di(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenylmethane；di(5-cyclohexyl-4-hydroxy-2-methylphenyl)-3,4-dihydroxyphenylmethane；4-[Bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)methyl]benzene-1,2-diol
• CAS: 160545-17-5
• 化学式: C₃₃H₄₀O₄
• 分子量: 500.678
• InChiKey: XHHCPUPIFYYPCN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.7
• 重原子数：
  37
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  间二甲氨基苯甲酸 、 4-[bis(2-methyl-4-hydroxy-5-cyclohexylphenyl)methyl]-1,2-dihydroxybenzene 在 4-二甲氨基吡啶 、 1-(3-二甲基氨基丙基)-3-乙基碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 生成 [4-[Bis[5-cyclohexyl-4-[3-(dimethylamino)benzoyl]oxy-2-methylphenyl]methyl]-2-[3-(dimethylamino)benzoyl]oxyphenyl] 3-(dimethylamino)benzoate
  参考文献：
  名称：

  CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND

  摘要：

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。

  公开号：

  US20200209739A1

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：HADA Hideo

  公开号：US20120264061A1

  公开（公告）日：2012-10-18

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; Y 11 represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

  一种抗蚀组合物，包括在酸和酸发生剂组分（B）的作用下，在碱性显影溶液中表现出改变溶解性的基础组分（A），所述酸发生剂组分（B）包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1''）表示的化合物（R1''-R3''表示芳基或烷基，但至少其中一个R1''-R3''表示被(b1-1-0)表示的基团取代的取代芳基，且其中两个R1''-R3''可以相互键合以形成与硫原子形成环的环；X表示C3-C30烃基；Q1表示含有羰基的二价连接基团；X10表示C1-C30烃基；Q3表示单键或二价连接基团；Y10表示—C(═O)—或—SO2—；Y11表示C1-C10烷基或氟代烷基；Q2表示单键或烷基基团；W表示C2-C10烷基基团。
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。
• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Kawaue Akiya

  公开号：US20100136478A1

  公开（公告）日：2010-06-03

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

  一种抗蚀组合物，包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分（A）和在暴露后产生酸的酸发生剂组分（B），酸发生剂组分（B）包括含有由通式（I）表示的阳离子基团的化合物的酸发生剂（B1）（在该式中，R5代表具有羰基、酯键或磺酰基的有机基团；Q代表二价连接基团）。
• Resist composition, method of forming resist pattern, novel compound and acid generator
  申请人：Kawaue Akiya

  公开号：US20100196820A1

  公开（公告）日：2010-08-05

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q 5 represents a single bond or a divalent linking group).

  一种抗蚀组合物，包括在酸处理下在碱性显影溶液中表现出溶解性变化的基础组分（A）和在暴露后生成酸的酸生成组分（B），酸生成组分（B）包括含有由通式（I）表示的阳离子基团的酸生成剂（B1）（在该式中，R5代表氢原子或具有1至30个碳原子的有可能具有取代基的有机基团；Q5代表单键或二价连接基团）。