BENZANTHRACENE DERIVATIVES FOR ORGANIC ELECTROLUMINESCENT DEVICES
申请人:Stoessel Philipp
公开号:US20100187505A1
公开(公告)日:2010-07-29
The present invention relates to the compounds of the formula (1) and to organic electroluminescent devices, in particular blue-emitting devices, in which these compounds are used as host material or dopant in the emitting layer and/or as hole-transport material and/or as electron-transport material.
Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
申请人:BASF Lacke + Farben Aktiengesellschaft
公开号:EP0571899A1
公开(公告)日:1993-12-01
Die Erfindung betrifft durch Einwirkung von Strahlung vernetzende Gemische, im wesentlichen bestehend aus
(I) mindestens einer in polaren organischen Lösungsmitteln löslichen carboxylgruppenhaltigen polymeren Vorstufe hochtemperaturbeständiger heterocyclischer Polymerer,
(II) einem copolymerisierbaren ethylenisch ungesättigten ternären Sulfoniumsalz,
(III) einem Photoinitiator oder Photoinitiatorsystem und
(IV) mindetens einem polaren aprotischen organischen Lösungsmittel.
Diese Gemische eignen sich zur Herstellung hochtemperaturbeständiger Reliefstrukturen.
本发明涉及在辐射作用下交联的混合物,主要包括
(I) 至少一种可溶于极性有机溶剂的耐高温杂环聚合物的含羧基聚合物前体、
(II) 可共聚的乙烯不饱和三元锍盐
(III) 一种光引发剂或光引发剂体系,以及
(IV) 至少一种极性烷基有机溶剂。
这些混合物适用于生产耐高温浮雕结构。
Developing solution and method of forming polyimide pattern by using the developing solution
申请人:Yoshiaki Kawamonzen
公开号:US20010006767A1
公开(公告)日:2001-07-05
Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10
−14
] of 5 to 8 within an aqueous solution of 25° C.
Resin-encapsulated semiconductor apparatus and process for its fabrication
申请人:Hitachi, Ltd.
公开号:US20020027268A1
公开(公告)日:2002-03-07
The present invention provides a resin-encapsulated semiconductor apparatus comprising a semiconductor device having a ferroelectric film and a surface-protective film, and an encapsulant member comprising a resin; the surface-protective film being formed of a polyimide. The present invention also provides a process for fabricating a resin-encapsulated semiconductor apparatus, comprising the steps of forming a film of a polyimide precursor composition on the surface of a semiconductor device having a ferroelectric film; heat-curing the polyimide precursor composition film to form a surface-protective film formed of a polyimide; and encapsulating, with an encapsulant resin, the semiconductor device on which the surface-protective film has been formed. The polyimide may preferably have a glass transition temperature of from 240° C. to 400° C. and a Young's modulus of from 2,600 MPa to 6 GPa. The curing may preferably be carried out at a temperature of from 230° C. to 300° C.