3a,7a-Dihydro-1,2,3-benzothiadiazole | 73299-03-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑啉类
• 英文名称: 3a,7a-Dihydro-1,2,3-benzothiadiazole
• CAS: 73299-03-3
• 化学式: C₆H₆N₂S
• 分子量: 138.19
• InChiKey: IXWDMNHEKAMXCY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  9
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  50
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Pyrimidinylpyrazoles as Tgf-Beta Inhibitors
  申请人：Lee Wen-Cherng

  公开号：US20080171755A1

  公开（公告）日：2008-07-17

  The invention is based on the discovery that compounds of formula (I) possess high affinity for Alk 5 and/or Alk 4, and can be useful as antagonists thereof for preventing and/or treating numerous diseases, including fibrotic disorders. The invention features a compound of formula (I) and uses thereof: formula (I).

  该发明基于发现，公式（I）化合物具有高亲和力与Alk 5和/或Alk 4，并可用作其拮抗剂，用于预防和/或治疗多种疾病，包括纤维化疾病。该发明涉及公式（I）的化合物及其用途：公式（I）。
• TREATING SOLUTION FOR ELECTRONIC PARTS, AND PROCESS FOR PRODUCING ELECTRONIC PARTS
  申请人：FINE POLYMERS CORPORATION

  公开号：US20150279654A1

  公开（公告）日：2015-10-01

  The invention provides an aqueous solution capable of selectively protecting a nitrogen-containing silicon compound from corrosion by a treating solution for etching, cleaning or the like, etching oxygen-containing, carbon-containing silicon in particular, and making a large etch rate difference between a nitrogen-containing silicon compound and an oxygen-containing silicon compound, and a process for producing electronic parts as well. The invention is embodied by a treating solution for electronic parts that is an aqueous solution containing one or two or more of anionic surface active agents represented by the following formulae (1), (2) and (3), and a process for producing an electronic part. wherein R 1 , R 2 , and R 3 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X 1 stands for a functional group capable of becoming an anionic ion. wherein R 4 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, X 2 stands for a functional group capable of becoming an anionic ion, and n stands for a natural number of greater than 2. wherein R 5 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X 3 , and X 4 stands for a functional group capable of becoming an anionic ion.
• NOVEL ANTIFUNGAL 5,6-DIHYDRO-4H-PYRROLO[1,2-a][1,4]BENZO-DIAZEPINES AND 6H-PYRROLO[1,2-a][1,4]BENZODIAZEPINES SUBSTITUTED WITH HETEROCYCLIC DERIVATIVES
  申请人：JANSSEN PHARMACEUTICA NV

  公开号：US20170073348A1

  公开（公告）日：2017-03-16

  The present invention is concerned with novel antifungal 5,6-dihydro-4H-pyrrolo-[1,2-a][1,4]benzodiazepines and 6H-pyrrolo[1,2-a][1,4]benzodiazepines substituted with heterocyclic derivatives of Formula (I) wherein R 1 , R 2 , R 3 , R 4 and Het have the meaning defined in the claims. The compounds according to the present invention are active mainly against dermatophytes and systemic fungal infections. The invention further relates to processes for preparing such novel compounds, pharmaceutical compositions comprising said compounds as an active ingredient as well as the use of said compounds as a medicament.
• US9812315B2
  申请人：——

  公开号：US9812315B2

  公开（公告）日：2017-11-07
• US9975899B2
  申请人：——

  公开号：US9975899B2

  公开（公告）日：2018-05-22