申请人:Ciba-Geigy Corporation
公开号:US04385182A1
公开(公告)日:1983-05-24
Novel thioxanthonecarboxylic acids and thioxanthonecarboxylic acid derivatives of the formula I ##STR1## in which Y is --COOH, --CO-halogen, --CN or a carboxylic acid ester, thioester or amide group and X, Z and W are as defined in the patent claim, are described. The compounds of the formula I in which Y is other than --CO--halogen are suitable as sensitizers for photo-crosslinkable polymers or as initiators for photo-polymerization of ethylenically unsaturated compounds or for photo-chemical crosslinking of polyolefins. The acid halides of the formula I are starting materials for the preparation of the corresponding nitriles and carboxylic acid esters, thioesters and amides.
新型噻吩羧酸和噻吩羧酸衍生物的化学式I ##STR1## 其中Y为--COOH,--CO-卤素,--CN或羧酸酯,硫酯或酰胺基团,而X、Z和W如专利要求中所定义。化学式I中Y不是--CO--卤素的化合物适用于作为光交联聚合物的增感剂,或作为乙烯不饱和化合物的光聚合引发剂,或用于聚烯烃的光化学交联。化学式I的酸卤是制备相应的腈和羧酸酯,硫酯和酰胺的起始材料。