1,1'-[(Diazomethylene)disulfonyl]bis(4-methylcyclohexane) | 462653-49-2

• 分子结构分类: 有机化合物 - 有机硫化合物 - 磺酰类
• 英文名称: 1,1'-[(Diazomethylene)disulfonyl]bis(4-methylcyclohexane)
• 英文别名: 1-[diazo-(4-methylcyclohexyl)sulfonylmethyl]sulfonyl-4-methylcyclohexane
• CAS: 462653-49-2
• 化学式: C15H26N2O4S2
• 分子量: 362.5
• InChiKey: RLTFGRULFNLJES-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  87
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• Antireflective Film, Method of Manufacturing Antireflective Film, Polarizing Plate and Image Display Device Using the Same
  申请人：Fukushige Yuuichi

  公开号：US20080234461A1

  公开（公告）日：2008-09-25

  An antireflective film comprising: a support; and at least one layer including an antireflective layer, wherein at least one of said at least one layer laminated on the support is a layer formed by ionizing radiation curing of a composition containing a combination of a radical polymerization initiator with at least one compound selected from two or more kinds of initiator assistants and further containing an ionizing radiation curable compound.
• POSITIVE PHOTOSENSITIVE COMPOSITION
  申请人：Kodama Kunihiko

  公开号：US20090148791A1

  公开（公告）日：2009-06-11

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
• US7255971B2
  申请人：——

  公开号：US7255971B2

  公开（公告）日：2007-08-14
• US7435526B2
  申请人：——

  公开号：US7435526B2

  公开（公告）日：2008-10-14