1,3-Diethylpiperidin-2-one | 321746-33-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 哌啶类
• 英文名称: 1,3-Diethylpiperidin-2-one
• CAS: 321746-33-2
• 化学式: C₉H₁₇NO
• 分子量: 155.24
• InChiKey: DAUWWJCGVBCLKR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• EP1212150A4
  申请人：——

  公开号：EP1212150A4

  公开（公告）日：2003-04-02
• LACTAM COMPOSITIONS FOR CLEANING ORGANIC AND PLASMA ETCHED RESIDUES FOR SEMICONDUCTOR DEVICES
  申请人：EKC TECHNOLOGY, INC.

  公开号：EP1212150A1

  公开（公告）日：2002-06-12
• Methods and compositions for chemically treating a substrate using foam technology
  申请人：——

  公开号：US20030171239A1

  公开（公告）日：2003-09-11

  The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrates with small features, where such undesired matter may comprise organic and inorganic compounds such as particles, films from photoresist material, and traces of any other impurities such as metals deposited during planarization or etching. A method according to the present invention for treating a surface of a substrate comprises generating a foam from a liquid composition, wherein the liquid composition comprises a gas; a surfactant; and at least one component selected from the group consisting of a fluoride, a hydroxylamine, an amine and periodic acid; contacting the foam with the surface of a substrate; and, removing the undesired matter from the surface of the substrate.
• Methods for chemically treating a substrate using foam technology
  申请人：Patel P. Bakul

  公开号：US20070135321A1

  公开（公告）日：2007-06-14

  The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrates with small features, where such undesired matter may comprise organic and inorganic compounds such as particles, films from photoresist material, and traces of any other impurities such as metals deposited during planarization or etching. A method according to the present invention for treating a surface of a substrate comprises generating a foam from a liquid composition, wherein the liquid composition comprises a gas; a surfactant; and at least one component selected from the group consisting of a fluoride, a hydroxylamine, an amine and periodic acid; contacting the foam with the surface of a substrate; and, removing the undesired matter from the surface of the substrate.
• US6235693B1
  申请人：——

  公开号：US6235693B1

  公开（公告）日：2001-05-22