二(呋喃-2-基)-二甲基硅烷 | 1578-44-5

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 中文名称: 二(呋喃-2-基)-二甲基硅烷
• 英文名称: bis (2-furyl)dimethylsilane
• 英文别名: Dimetyl-di(2-furanyl)silan；bis(2-furyl)dimethylsilane；di(2-furyl)dimethylsilane；dimethyldi(2-furyl)silane；di-furan-2-yl-dimethyl-silane；di(2-furyl)-dimethyl-silane；Di-(2-furyl)dimethyl silane；bis(furan-2-yl)-dimethylsilane
• CAS: 1578-44-5
• 化学式: C₁₀H₁₂O₂Si
• 分子量: 192.29
• InChiKey: LICNAKTVYIFWGC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  二(呋喃-2-基)-二甲基硅烷 以 四氢呋喃 、 正己烷 为溶剂， 反应 4.0h， 生成 [2-(4,5-二氢呋喃基)]二甲基苯基硅烷
  参考文献：
  名称：

  Cleavage of SiC and GeC bonds in heterylsilanes and -germanes by organolithium reagents

  摘要：

  Organolithium reagents RLi can cleave Si-C and Ge-C bonds in heterylsilanes and -germanes substituting furyl, dihydrofuryl and dihydropyranyl groups for the organolithium residue R.

  DOI：

  10.1016/0022-328x(92)80169-x
• 作为产物：
  描述：

  bis-2-(5,6-dihydro-4H-pyranyl)dimethylsilane 以 四氢呋喃 、 正己烷 为溶剂， 反应 2.0h， 生成 二(呋喃-2-基)-二甲基硅烷
  参考文献：
  名称：

  Cleavage of SiC and GeC bonds in heterylsilanes and -germanes by organolithium reagents

  摘要：

  Organolithium reagents RLi can cleave Si-C and Ge-C bonds in heterylsilanes and -germanes substituting furyl, dihydrofuryl and dihydropyranyl groups for the organolithium residue R.

  DOI：

  10.1016/0022-328x(92)80169-x

文献信息

• Silylfurane und Bis(silyl)butadiine -Synthese, Lithiumderivate, Kristallstrukturen/ Silylfurans and Bis(silyl)butadiynes - Synthesis, Lithium Derivatives, Crystal Structures
  作者：Peter Neugebauer、Uwe Klingebiel、Mathias Noltemeyer

  DOI：10.1515/znb-2000-1005

  日期：2000.10.1

  Furan reacts with BuLi and halosilanes to give mono- (1, 5, 7), bis- (2, 6), tris- (3), and tetrakis(2-furanyl)silanes (4); (Fu-R; R = SiMe₂Cl (1), SiisoPr₂F (5), Si^tBu₂F (7); Fu-R-Fu; R = SiMe₂ (2), SiisoPr₂ (6); Fu₃Si^tBu (3), Fu₄Si (4)), 2,5-Bis(silyl)furans (8, 9) are obtained in the reaction of dilithiated furan and fluorosilanes in a molar ratio 1:2 (R-Fu-R; R = SiisoPr₂F (8), Si^tBu₂F (9), 1,4-Bis(di-tert-butylfluorosilyl)butadiyne (10) is formed from furan four equivalents of BuLi, and two equivalents of F₂Si^tBu₂. 10 reacts with KOH to give ^tBu₂(OH )Si-C =C -C =C-Si^tBu₂OH (11). Substitution of the fluorine atoms of 5 and 7 by a NH₂ group occurs with MNH₂ (M = Li, Na). 12 and 13 are obtained. The reaction of 13 with BuLi and ^tBu₂SiF₂ leads to the formation of FuSi^tBu₂NHSi^tBu₂F (14) and ^tBu₂Si(NH-Si^tBu₂Fu)₂ (15). The lithium derivative of 14 crystallizes as monomer from THF as FuSi^tBu₂N(LiTHF₂)Si^tBu₂F and as a dimer containing a four-membered ring (16) from n-hexane (FuSi^tBu₂NSi^tBu₂LiF)₂ (17). The crystal structures of 4, 10, 16,17 have been determined.

  摘要：Furan与BuLi和卤代硅烷反应，得到单-(1, 5, 7)、双-(2, 6)、三-(3)和四-(2-呋喃基)硅烷(4)；在二锂化呋喃和氟硅烷的反应中以1:2的摩尔比获得2,5-双(硅烷基)呋喃(8, 9)（R-Fu-R；R = SiisoPr2F(8)、Si t Bu2F(9)）；1,4-双(二叔丁基氟硅基)丁二炔(10)由呋喃四当量的BuLi和两当量的F2Si t Bu2形成。 10与KOH反应生成tBu2(OH)Si-C=C-C=C-SitBu2OH(11)。用MNH2(M = Li, Na)取代5和7的氟原子得到12和13。13与BuLi和tBu2SiF2反应形成FuSitBu2NHSitBu2F(14)和tBu2Si(NH-SitBu2Fu)2(15)。14的锂衍生物以FuSitBu2N(LiTHF2)SitBu2F的单体晶化，以含有四元环的二聚体(16)从正己烷中晶化(FuSitBu2NSitBu2LiF)2(17)。已确定了4、10、16、17的晶体结构。
• Conversions of [2-(4,5-dihydrofuryl)]-silanes and -germanes under catalytic hydrogenation conditions
  作者：E. Lukevics、V.N. Gevorgyan、Y.S. Goldberg、M.V. Shymanska

  DOI：10.1016/0022-328x(85)87465-9

  日期：1985.10

  (2-Tetrahydrofuryl)-silanes and -germanes were obtained in high yield by the heterogeneous liquid-phase hydrogenation of [2-(4,5-dihydrofuryl)]trimethylsilane (I), bis[2-(4,5-dihydrofuryl)]dimethylsilane (II) and [2-(4,5-dihydrofuryl)]trimethylgermane with a Pd/Al2O3 catalyst. The dihydrofurylsilanes I and II were found to undergo disproportionation and dehydrogenation, the latter being involved in

  通过[2-（4,5-二氢呋喃基）]三甲基硅烷（I），双[2-（4,5-二氢呋喃基）的异相液相加氢，高产率地获得了（2-四氢呋喃基）-硅烷和-锗烷。含Pd / Al 2 O 3催化剂的]二甲基硅烷（II）和[2-（4,5-二氢呋喃基）]三甲基锗烷。发现二氢呋喃基硅烷I和II经历歧化和脱氢，后者参与分子内和分子间歧化。
• Lukevits, E.; Erchak, N. P.; Matorykina, V. F., Journal of general chemistry of the USSR, 1983, vol. 53, # 5, p. 959 - 967
  作者：Lukevits, E.、Erchak, N. P.、Matorykina, V. F.、Mazheika, I. B.

  DOI：——

  日期：——
• High-yield electrosynthesis of furylchlorosilanes, silyl and silanylene furans
  作者：Carole Moreau、Françoise Serein-Spirau、Michel Bordeau、Claude Biran

  DOI：10.1016/s0022-328x(98)00853-5

  日期：1998.11

  The intensiostatic sacrificial anode technique proved to be efficient for the silylation of 2-bromo- and 2,5-dibromofurans with trimethylchlorosilane and diorganodichlorosilanes with high selectivity and versatility not accessible by pure chemical routes. Furylsilanes, bromofurylsilanes, bis(furyl)silanes, bis(bromofuryl)silanes, furylchlorosilanes, bis(silyl and chlorosilyl)furans, poly[(silanylene)furylene] oligomers and [1(4)]dimethylsila-2,5-furanocalixarene were obtained in good to high yields. (C) 1998 Elsevier Science S.A. All rights reserved.
• LUKEVITS, EH.;ERCHAK, N. P.;MATORYKINA, V. F.;MAZHEJKA, I. B., ZH. OBSHCH. XIMII, 1983, 53, N 5, 1082-1092
  作者：LUKEVITS, EH.、ERCHAK, N. P.、MATORYKINA, V. F.、MAZHEJKA, I. B.

  DOI：——

  日期：——