PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION
申请人:KODAMA Kunihiko
公开号:US20080220371A1
公开(公告)日:2008-09-11
A photosensitive composition comprises: (A) a compound capable of generating an acid represented by formula (I) upon irradiation with actinic ray or radiation; and (B) a resin that decomposes by the action of an acid to its increase solubility in an alkali developer
wherein Ra represents an alkyl group substituted with a fluorine atom, or an aryl group substituted with a fluorine atom or a group having a fluorine atom; Rb represents an alkyl group not substituted with a fluorine atom on α-position of the alkyl group, or an aryl group not substituted with a fluorine atom or a group having a fluorine atom.
RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
申请人:TSUCHIMURA Tomotaka
公开号:US20110318691A1
公开(公告)日:2011-12-29
An embodiment of the composition contains any of compounds of general formula (I) below:
US7601850B2
申请人:——
公开号:US7601850B2
公开(公告)日:2009-10-13
Backer; Stedehouder, Recueil des Travaux Chimiques des Pays-Bas, 1933, vol. 52, p. 437,452