Ultrasound-Assisted eco-friendly synthesis of triarylmethanes catalyzed by silica sulfuric acid
作者:I. Mohammadpoor-Baltork、M. Moghadam、S. Tangestaninejad、V. Mirkhani、K. Mohammadiannejad-Abbasabadi、M. A. Zolfigol
DOI:10.1007/bf03245914
日期:2011.9
An efficient and eco-friendly synthesis of triarylmethanes by the reaction of arenes with aldehydes in the presence of silicasulfuricacid as a heterogeneous and reusable catalyst under ultrasonic irradiation is reported. The advantages of this protocol are the use of green solvents, inexpensive catalyst, commercially available precursors, reusability of SSA, simple work-up, high yields and short
H3PW12O40-Catalysed Alkylation of Arenes and Diveratrylmethanes: Convenient Routes to Triarylmethanes and to Symmetrical and Unsymmetrical 9,10-Diaryl-2,3,6,7-tetramethoxyanthracenes
作者:Iraj Mohammadpoor-Baltork、Majid Moghadam、Shahram Tangestaninejad、Valiollah Mirkhani、Kazem Mohammadiannejad-Abbasabadi、Hamid R. Khavasi
DOI:10.1002/ejoc.201001267
日期:2011.3
preparation of symmetrical9,10-diaryl-2,3,6,7-tetramethoxyanthracenes. The conversion of aldehydes into their corresponding acylals in the presence of H 3 PW 12 O 40 and the one-pot reactions of diveratrylmethanes with these acylals were also used for the synthesis of symmetrical and unsymmetrical9,10-diaryl-2,3,6,7-tetramethoxyanthracenes.
已经开发了一种在热和微波辐射条件下,在 H 3 PW 12 O 40 作为可重复使用的催化剂存在下,通过醛和芳烃之间的无溶剂反应合成三芳基甲烷和二呋喃基芳基甲烷的有效方法。H 3 PW 12 O 40 催化的藜芦醇和醛之间的一锅连续傅-克反应也被用作制备对称 9,10-二芳基-2,3,6,7-四甲氧基蒽的便捷方案。在 H 3 PW 12 O 40 存在下醛类转化为相应的酰基醛以及二重芳基甲烷与这些酰基的一锅反应也用于合成对称和不对称的 9,10-二芳基-2,3,6 ,7-四甲氧基蒽。
Stable Organic Biradicals
作者:GILBERT J. SLOAN、WYMAN R. VAUGHAN
DOI:10.1021/jo01358a009
日期:1957.7
Dual-Reagent Catalysis within Ir−Sn Domain: Highly Selective Alkylation of Arenes and Heteroarenes with Aromatic Aldehydes
作者:Susmita Podder、Joyanta Choudhury、Ujjal Kanti Roy、Sujit Roy
DOI:10.1021/jo062633n
日期:2007.4.1
Reactions of arenes and heteroarenes with aromatic aldehydes proceeded smoothly in the presence of a catalytic combination of [Ir(COD)Cl](2)-SnCl4 to afford the corresponding triarylmethane derivatives (TRAMs) in high yields. This 100% TRAM selective transformation is clean and eliminates the use of acid systems.
RESIST UNDERLAYER FILM FORMING COMPOSITION THAT CONTAINS NOVOLAC RESIN HAVING POLYNUCLEAR PHENOL
申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20150184018A1
公开(公告)日:2015-07-02
There is provided a composition for forming a resist underlayer film which has high dry-etching resistance and wiggling resistance, and achieves excellent planarizing properties for a semiconductor substrate surface having level differences or irregular portions. A resist underlayer film-forming composition including a phenol novolac resin that is obtained by causing a compound that has at least three phenolic groups, in which each of the phenolic groups has a structure bonded to a tertiary carbon atom or has a structure bonded to a quaternary carbon atom to which a methyl group binds, to react with an aromatic aldehyde or an aromatic ketone in the presence of an acid catalyst. The phenol novolac resin preferably contains a unit structure of Formula (1), a unit structure of Formula (2), a unit structure of Formula (3), a unit structure of Formula (4), or a combination of these unit structures: