1-(环己基羰基)-2,6-二甲基哌啶 | 5005-28-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 哌啶类
• 中文名称: 1-(环己基羰基)-2,6-二甲基哌啶
• 英文名称: Cyclohexyl-(2,6-dimethyl-piperidin-1-yl)-methanone
• 英文别名: 1-(Cyclohexylcarbonyl)-2,6-dimethylpiperidine；cyclohexyl-(2,6-dimethylpiperidin-1-yl)methanone
• CAS: 5005-28-7
• 化学式: C₁₄H₂₅NO
• mdl: MFCD01701059
• 分子量: 223.359
• InChiKey: CFSVDFDJZBYXIZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  16
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.928
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  1

安全信息

• 海关编码：
  2933399090

文献信息

• Photosensitive resin composition, protective film, and liquid crystal display element
  申请人：Chi Mei Corporation

  公开号：US10162260B2

  公开（公告）日：2018-12-25

  The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II): Condition (I): the main chain further includes a repeating unit derived from unsaturated monomer (a1-1) including a carboxylic acid or a carboxylic anhydride. Condition (II): the siloxane based monomer (a2) includes a monomer (a2-1) represented by formula (A-4).

  本发明展示了一种光敏树脂组合物，可用于保护膜和液晶显示元件，具有良好的透明性和高耐化学腐蚀性。该组合物包括复合树脂（A）、邻萘醌重氮磺酸盐（B）和溶剂（C）。复合树脂（A）包括一条主链和一条侧链。主链包括由硅氧烷（甲基）丙烯酸酯单体（a1-2）衍生的重复单元。侧链包括硅氧烷基单体（a2）衍生的重复单元，并与硅氧烷（甲基）丙烯酸酯基单体（a1-2）衍生的重复单元键合。复合树脂（A）至少满足以下条件（I）和（II）之一： 条件 (I)：主链还包括一个由不饱和单体（a1-1）衍生的重复单元，不饱和单体（a1-1）包括羧酸或羧酸酐。 条件（II）：硅氧烷基单体（a2）包括由式（A-4）表示的单体（a2-1）。
• PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT
  申请人：Chi Mei Corporation

  公开号：US20170168390A1

  公开（公告）日：2017-06-15

  The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II): Condition (I): the main chain further includes a repeating unit derived from unsaturated monomer (a1-1) including a carboxylic acid or a carboxylic anhydride. Condition (II): the siloxane based monomer (a2) includes a monomer (a2-1) represented by formula (A-4).