Franchimont; Taverne, Recueil des Travaux Chimiques des Pays-Bas, 1896, vol. 15, p. 74
作者:Franchimont、Taverne
DOI:——
日期:——
HIMBERT, G.;FEUSTEL, M.;JUNG, M., LIEBIGS ANN. CHEM., 1981, N 11, 1907-1927
作者:HIMBERT, G.、FEUSTEL, M.、JUNG, M.
DOI:——
日期:——
BEW, C.;JOSHI, V. O.;GRAY, J.;KAYE, P. T.;MEAKINS, G. D., J. CHEM. SOC. PERKIN TRANS., 1982, N 4, 945-948
作者:BEW, C.、JOSHI, V. O.、GRAY, J.、KAYE, P. T.、MEAKINS, G. D.
DOI:——
日期:——
Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
申请人:Matsumura Toshiyuki
公开号:US20070020555A1
公开(公告)日:2007-01-25
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.