1-butyl-4,5-dihydro-1H-imidazole | 45716-46-9

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑啉类
• 英文名称: 1-butyl-4,5-dihydro-1H-imidazole
• 英文别名: 1-(n.Butyl)-2-imidazolin；1-Butyl-4,5-dihydroimidazole
• CAS: 45716-46-9
• 化学式: C₇H₁₄N₂
• 分子量: 126.202
• InChiKey: VTPVXIGCSXBDLN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  9
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  15.6
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1-butyl-4,5-dihydro-1H-imidazole 以46%的产率得到
  参考文献：
  名称：

  GIESECKE H.; HOCKER J., SYNTHESIS, 1977, NO 11, 806-808

  摘要：

  DOI：

文献信息

• Amidate compound, catalyst for polyurethane production, and method for producing polyurethane resin
  申请人：KOEI CHEMICAL COMPANY, LIMITED

  公开号：US10689478B2

  公开（公告）日：2020-06-23

  Provided is an amidate compound represented by the formula (1): wherein A is a substituted or unsubstituted hydrocarbon group, n is an integer of 1 or more, and D is a nitrogen-containing organic group represented by the formula (2): wherein R1, R2, and R3 are the same or different, and are each a hydrocarbon group that may contain a heteroatom; some or all of R1, R2, and R3 may be bonded together to form a ring structure; X is a nitrogen atom, an oxygen atom, or a sulfur atom; and a is 0 or 1, wherein a is 1 when X is a nitrogen atom, and a is 0 when X is an oxygen atom or a sulfur atom.

  提供的是由式（1）表示的酰胺化合物：其中A是取代或未取代的碳氢基团，n是大于或等于1的整数，D是由式（2）表示的含氮有机基团：其中R1、R2和R3相同或不同，均为可能含有杂原子的碳氢基团；R1、R2和R3中的一些或全部可能结合在一起形成环结构；X是氮原子、氧原子或硫原子；a为0或1，当X为氮原子时，a为1，当X为氧原子或硫原子时，a为0。
• New 1,2,4,5-tetrakis-(N-imidazoliniummethyl)benzene and 1,2,4,5-tetrakis-(N-benzimidazoliummethyl)benzene salts as N-heterocyclic tetracarbene precursors: synthesis and involvement in ruthenium-catalyzed allylation reactions
  作者：Nevin Gürbüz、Serpil Demir、Ismail Özdemir、Bekir Cetinkaya、Christian Bruneau

  DOI：10.1016/j.tet.2009.12.004

  日期：2010.2

  New tetraimidazolinium and tetrabenzimidazolium salts have been prepared. Upon reaction with tBuOK, they generate carbene ligands, which were associated in situ to [RuCp*(MeCN)3]PF6 to produce new ruthenium catalysts that are active for the substitution of allylic substrates by amines, phenols, and carbonucleophiles. The influence of the N-heterocyclic core as well as that of the N-substitutents at

  已经制备了新的四咪唑啉鎓盐和四苯并咪唑鎓盐。与t BuOK反应后，它们生成卡宾配体，该卡宾配体与[RuCp *（MeCN）3 ] PF 6原位缔合，从而生成新的钌催化剂，该催化剂对用胺，酚和碳亲核试剂取代烯丙基底物具有活性。已经研究了N-杂环核心以及盐外围的N-取代基对反应性和区域选择性的影响。
• METHODS FOR PRODUCING FUELS, GASOLINE ADDITIVES, AND LUBRICANTS USING AMINE CATALYSTS
  申请人：The Regents of the University of California

  公开号：US20170327448A1

  公开（公告）日：2017-11-16

  Provided herein are methods for producing α,β-unsaturated ketones from the condensation of methyl ketones in the presence of an amine catalyst. Such amine catalysts may be supported, for example, on a silica-alumina support. Such amine catalysts may be used in the presence of an additional acid. The α,β-unsaturated ketones may be produced by dimerization and/or timerization of the methyl ketones. Such α,β-unsaturated ketones may be suitable for use in producing fuels, gasoline additives, and/or lubricants, or precursors thereof. The methyl ketones may be obtained from renewable sources, such as by the fermentation of biomass.

  本文提供了一种制备α，β-不饱和酮的方法，该方法是通过在胺催化剂存在下对甲基酮进行缩合反应实现的。这样的胺催化剂可以被负载在二氧化硅-氧化铝载体上。这样的胺催化剂可以在存在额外酸的情况下使用。α，β-不饱和酮可以通过甲基酮的二聚化和/或三聚化产生。这样的α，β-不饱和酮可适用于生产燃料、汽油添加剂和/或润滑剂，或其前体。甲基酮可以从可再生来源获得，例如通过生物质发酵。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP
  申请人：Nissan Chemical Industries, Ltd.

  公开号：US20130078814A1

  公开（公告）日：2013-03-28

  There is provided a method of making a semiconductor device utilizing a resist underlayer film forming composition comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) (1).

  提供了一种利用含有阴离子基团的硅烷化合物作为抗蚀底层膜形成组合物的半导体器件制造方法。其中，含有阴离子基团的硅烷化合物是一种可水解的有机硅烷化合物，其中含有阴离子基团的有机基团与硅原子键合，并形成盐结构，其水解产物或水解缩合产物。阴离子基团可以是羧酸阴离子、苯酚阴离子、磺酸阴离子或膦酸阴离子。可水解的有机硅烷化合物可以是公式（1）的化合物：R1aR2bSi（R3）4−（a+b）（1）。
• SILICON-CONTAINING RESIST UNDERLAYER FILM FORMATION COMPOSITION HAVING ANION GROUP
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP2372458A1

  公开（公告）日：2011-10-05

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R1aR2Si(R3)4-(a+b) (1). A composition comprising a mixture of a hydrolyzable organosilane of Formula (1), and at least one organic silicon compound selected from the group consisting of a compound of Formula (2): R4aSi(R5)4-a (2) and a compound of Formula (3): [R6cSi(R7)3-c]2Yb (3); a hydrolysis product of the mixture; or a hydrolysis-condensation product of the mixture.

  本发明提供了一种光刻用抗蚀剂底层成膜组合物，用于形成可用作硬掩膜的抗蚀剂底层膜。一种用于光刻的抗蚀剂底层成膜组合物包含含有阴离子基团的硅烷化合物，其中含有阴离子基团的硅烷化合物是一种可水解的有机硅烷，其中含有阴离子基团的有机基团与硅原子键合，阴离子基团形成盐结构、其水解产物或其水解缩合产物。阴离子基团可以是羧酸阴离子、酚酸阴离子、磺酸阴离子或膦酸阴离子。可水解有机硅烷可以是式 (1) 的化合物：R1aR2Si(R3)4-(a+b) (1)。一种组合物，包含式（1）的可水解有机硅烷和至少一种选自由式（2）化合物组成的组的有机硅化合物的混合物：R4aSi(R5)4-a(2)和式(3)化合物：[R6cSi(R7)3-c]2Yb (3)；混合物的水解产物；或混合物的水解缩合产物。