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bis(2-methyl-4-hydroxyphenyl)-phenylmethane | 2510-19-2

中文名称
——
中文别名
——
英文名称
bis(2-methyl-4-hydroxyphenyl)-phenylmethane
英文别名
4,4'-(phenylmethylene)bis[3-methylphenol];4,4'-(Phenylmethylene)bis(3-methylphenol);4-[(4-hydroxy-2-methylphenyl)-phenylmethyl]-3-methylphenol
bis(2-methyl-4-hydroxyphenyl)-phenylmethane化学式
CAS
2510-19-2
化学式
C21H20O2
mdl
——
分子量
304.389
InChiKey
JAHIXHIEPHMNET-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5.3
  • 重原子数:
    23
  • 可旋转键数:
    3
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

  • 作为反应物:
    描述:
    参考文献:
    名称:
    ISLAM A. M.; RASHAD M. E.; WASSEL M. M., EGYPT. J. CHEM., 1977(1980), 20, NO 5, 483-490
    摘要:
    DOI:
  • 作为产物:
    描述:
    间甲酚苯甲醛盐酸 以60%的产率得到
    参考文献:
    名称:
    ISLAM A. M.; RASHAD M. E.; WASSEL M. M., EGYPT. J. CHEM., 1977(1980), 20, NO 5, 483-490
    摘要:
    DOI:
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文献信息

  • Phenolic-hydroxyl-group-containing novolac resin and resist film
    申请人:DIC Corporation
    公开号:US10577449B2
    公开(公告)日:2020-03-03
    There are provided a phenolic-hydroxyl-group-containing novolac resin and resist film that are excellent in developability, heat resistance, and conformability to substrates. The phenolic-hydroxyl-group-containing novolac resin is a polycondensate of which the essential reactive components are a phenolic-hydroxyl-group-containing compound (A) represented by Structural Formula (1) [where Ar is a structural part represented by Structural Formula (Ar-1) or (Ar-2), a phenolic-hydroxyl-group-containing compound (B) represented by Structural Formula (2) [where R3 is an aliphatic hydrocarbon group having 4 to 20 carbon atoms, and j is an integer from 1 to 3], and an aldehyde compound (C).
    本发明提供了一种酚羟基酚醛树脂和抗蚀剂薄膜,它们具有优异的显影性、耐热性和对基材的顺应性。含酚羟基酚醛树脂是一种缩聚物,其主要活性成分是由结构式(1)代表的含酚羟基化合物(A)[其中 Ar 是由结构式(Ar-1)或(Ar-2)代表的结构部分、由结构式(2)代表的含酚羟基化合物(B)[其中 R3 是具有 4 至 20 个碳原子的脂族烃基,j 是 1 至 3 的整数],以及醛化合物(C)。
  • Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus
    申请人:ASAHI KASEI KABUSHIKI KAISHA
    公开号:US10831101B2
    公开(公告)日:2020-11-10
    A photosensitive resin composition containing a resin and a compound each having a structure specified by the present specification provides a cured film having excellent adhesiveness to copper wiring.
    一种光敏树脂组合物含有一种树脂和一种化合物,每种树脂和化合物都具有本说明书规定的结构,这种组合物提供的固化薄膜对铜线具有极佳的粘合性。
  • ISLAM A. M.; RASHAD M. E.; WASSEL M. M., EGYPT. J. CHEM., 1977(1980), 20, NO 5, 483-490
    作者:ISLAM A. M.、 RASHAD M. E.、 WASSEL M. M.
    DOI:——
    日期:——
  • MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND RESIST PERMANENT FILM
    申请人:DIC CORPORATION
    公开号:US20160017083A1
    公开(公告)日:2016-01-21
    The present invention provides a modified novolac phenol resin having excellent developability and heat resistance, a method for producing the same, a photosensitive composition, a resist material, and a permanent film. The modified novolac phenol resin has a molecular structure in which hydrogen atoms of phenolic hydroxyl groups possessed by a novolac phenol resin (C) are partially or entirely substituted by acid dissociable groups, the novolac phenol resin (C) being produced by condensing an aromatic compound (A) represented by structural formula (1) below with an aldehyde compound (B).
  • NOVOLAC-TYPE PHENOLIC HYDROXYL GROUP-CONTANING RESIN, PRODUCTION METHOD THEREFOR, CURABLE COMPOSITION, COMPOSITION FOR RESIST, AND COLOR RESIST
    申请人:DIC Corporation
    公开号:US20170121444A1
    公开(公告)日:2017-05-04
    The present invention provides a novolac-type phenolic hydroxyl group-containing resin having as a repeating unit a structural site represented by structural formula (1) below [in the formula, R 1 represents any one of a hydrogen atom, an alkyl group, and an aryl group, and X represents a structural site (α) represented by structural formula (2) below (in the formula, R 2 and R 3 each represent any one of a hydrogen atom, an alkyl group, an aryl group, and an aralkyl group; n and m are each an integer of 1 to 3; when n or m is 2 or 3, a plurality of each of R 2 and R 3 present in a molecule may be the same or different; and Ar represents any one of a phenyl group, a naphthyl group, an anthryl group, and a structural site)].
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