1-[2-Methyl-4-(methylsulphonyl)phenyl]piperidine-4-carboxylic acid | 942474-48-8

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 哌啶类
• 英文名称: 1-[2-Methyl-4-(methylsulphonyl)phenyl]piperidine-4-carboxylic acid
• 英文别名: 1-(2-methyl-4-methylsulfonylphenyl)piperidine-4-carboxylic acid
• CAS: 942474-48-8
• 化学式: C₁₄H₁₉NO₄S
• 分子量: 297.37
• InChiKey: OHUXRYMPVFPNCF-UHFFFAOYSA-N

物化性质

• 熔点：
  192-195°C
• 沸点：
  553.2±50.0 °C(Predicted)
• 密度：
  1.281±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  83.1
• 氢给体数：
  1
• 氢受体数：
  5

安全信息

• 危险等级：
  IRRITANT

文献信息

• RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045820A1

  公开（公告）日：2017-02-16

  A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
• US9910354B2
  申请人：——

  公开号：US9910354B2

  公开（公告）日：2018-03-06