[EN] NOVEL TRIS(ALLYL ETHER) COMPOUND HAVING TRIPHENYLALKANE FRAMEWORK [FR] NOUVEAU COMPOSÉ DE TRIS(ALLYL ÉTHER) AYANT UNE STRUCTURE DE TRIPHÉNYLALCANE [JA] トリフェニルアルカン骨格を有する新規なトリスアリルエーテル化合物
PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE
申请人:YAMANAKA Tsukasa
公开号:US20080081294A1
公开(公告)日:2008-04-03
A photosensitive resin composition contains: a polymer represented by the formula (I) as defined herein, in which 0.5 mol % or more of A in the polymer represented by the formula (I) is a protective group; a photosensitizing agent; a compound containing a methacryloyl or acryloyl group within a molecule of the compound; and a solvent.
[EN] NOVEL TRIS(ALLYL ETHER) COMPOUND HAVING TRIPHENYLALKANE FRAMEWORK<br/>[FR] NOUVEAU COMPOSÉ DE TRIS(ALLYL ÉTHER) AYANT UNE STRUCTURE DE TRIPHÉNYLALCANE<br/>[JA] トリフェニルアルカン骨格を有する新規なトリスアリルエーテル化合物
申请人:[en]HONSHU CHEMICAL INDUSTRY CO., LTD.;[ja]本州化学工業株式会社