Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
申请人:FUJIFILM Corporation
公开号:US07449573B2
公开(公告)日:2008-11-11
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.