7,7,8,8-Tetramethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene 1, prepared by the high-pressure reaction (10 000 bar) of 1,1,2,2-tetramethyl-1,2-disilacyclohexa-3,5-diene and phenyl vinyl sulphoxide followed by elimination of benzenesulphenic acid, gave tetramethyldisilene (Me2SiSiMe2) upon photolysis which underwent a photochemical [2 + 4] reaction with benzene at 10 K in an argon matrix to regenerate
通过1,1,2,2-的高压反应(10,000 bar)制备的7,7,8,8-四甲基-7,8-二硅双环[2.2.2] octa-2,5-二烯1四甲基1,2,2-二硅环己基-3,5-二烯和苯基乙烯基亚砜,然后消除苯磺酸,经光解后得到四甲基二ilene(Me 2 Si SiMe 2),在10 K下与苯发生光化学[2 + 4]反应在氩气基质中再生前驱体。