作者:Noriyuki Yamachika、Yuta Musha、Junji Sasano、Kazutaka Senda、Masaru Kato、Yutaka Okinaka、Tetsuya Osaka
DOI:10.1016/j.electacta.2008.01.018
日期:2008.5
It was found that, by choosing an optimum bath composition, amorphous Au–Ni alloy containing up to 40 at.% of Au with respect to the sum of Au and Ni can be electrodeposited from a bath prepared by excluding tungsten from the Au–Ni–W bath that we developed previously. Elemental analysis showed that the deposit contains 15–20 at.% of carbon and 2 at.% of nitrogen. Hardness of this deposit is almost
结果发现,通过选择最佳的镀液组成,可以从通过从Au-Ni中排除钨而制备的镀液中电沉积相对于Au和Ni的总含量最多占40 at。%Au的非晶Au-Ni合金–我们先前开发的W浴。元素分析表明,该矿床含15–20 at。%的碳和2 at。%的氮。该沉积物的硬度几乎是常规硬金的三倍。相对于纯金导线测得的电接触电阻与硬金相当。Au-Ni沉积物的无定形结构在最高300°C的温度下至少1 h是稳定的。非晶态无钨Au-Ni沉积物在制造微米级和纳米级电触点时值得考虑。