ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
申请人:FUJIFILM Corporation
公开号:EP3919980A1
公开(公告)日:2021-12-08
Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of obtaining a pattern having excellent LWR performance even in a case of long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.
M1+ A--L-B- M2+ (I)
本发明提供了一种即使在长期储存的情况下也能获得具有优异低功耗性能的图案的对放 射线敏感或对辐射敏感的树脂组合物。此外,还提供了一种抗蚀薄膜、一种图案形成方法和一种制造电子设备的方法,每种方法都与该光敏或辐射敏感树脂组合物有关。感光或辐射敏感树脂组合物包括通式 (I) 所代表的化合物和可酸性分解的树脂。
M1+ A--L-B- M2+ (I)