FLUORINE-CONTAINING SILICON COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORINE-CONTAINING SILICON RESIN
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20160229960A1
公开(公告)日:2016-08-11
The present invention provides a fluorine-containing silicon compound represented by the general formula (1),
wherein each R
1
independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R
2
independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. There can be provided a fluorine-containing silicon compound having good storage stability and useful as a raw material of a composition for forming a silicon-containing intermediate film and a silicon-containing photoresist composition used for a fine processing in the manufacturing process of a semiconductor device.