4,4'-(Phenylmethylene)di(benzene-1,2,3-triol) | 67399-43-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4'-(Phenylmethylene)di(benzene-1,2,3-triol)
• 英文别名: 4-[phenyl-(2,3,4-trihydroxyphenyl)methyl]benzene-1,2,3-triol
• CAS: 67399-43-3
• 化学式: C₁₉H₁₆O₆
• 分子量: 340.3
• InChiKey: AXVHIJISCVWEMJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  25
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  121
• 氢给体数：
  6
• 氢受体数：
  6

文献信息

• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070685A1

  公开（公告）日：2021-03-11

  The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.

  本发明提供一种具有以下式（0）所代表的特定结构的化合物，具有从该化合物衍生的组分单元的树脂，含有该化合物和/或树脂的各种组合物，以及使用这些组合物的各种方法。
• Method of preventing polymer scale formation
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP0372968A2

  公开（公告）日：1990-06-13

  A method of preventing polymer scale deposition in polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel in which its inner wall surface has been previously coated with a coating solution comprising: (A) a condensate of a phenolic hydroxy group-­containing compound, (B) at least one member selected from the group consisting of metal compounds and inorganic colloids, and (C) at least one member selected from the group consisting of dyes and pigments. This method makes it possible to prevent polymer scale deposition regardless of polymerization conditions such as the kind of monomers, the type of polymerization vessel, etc.

  一种在具有乙烯双键的单体的聚合过程中防止聚合物垢沉积的方法，其中所述聚合是在聚合容器中进行的，容器的内壁表面先前已涂有涂层溶液，涂层溶液包括 (A) 含酚羟基化合物的缩合物、 (B) 至少一种选自金属化合物和无机胶体的成员，以及 (C) 至少一种选自染料和颜料组的成员。无论单体种类、聚合容器类型等聚合条件如何，该方法都能防止聚合物垢沉积。
• Method of preventing polymer scale deposition in a polymerization vessel
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP0372996A2

  公开（公告）日：1990-06-13

  A method of preventing polymer scale deposition in a polymerization vessel during polymerization of a monomer having an ethylenically double bond, wherein said polymerization is carried out in a polymerization vessel of which the inner wall has been previously first coated with (A) a coating solution comprising a condensate of an aromatic compound and at least one member selected from the group consisting of metal compounds and inorganic col­loids, and the coating thus formed has been then coated with (B) a coating solution comprising at least one member selected from the group consisting of anionic polymeric compounds, amphoteric polymeric compounds and hydroxyl group-containing polymeric compounds; and a polymerization vessel having a coating thus formed. According this method, polymer scale deposition on the inner wall, etc. of the polymerization vessel can be effectively prevented.

  一种在具有乙烯双键的单体聚合过程中防止聚合物垢沉积在聚合容器中的方法，其中所述聚合是在聚合容器中进行的，聚合容器的内壁先前已先涂覆了以下涂层 (A) 由芳香族化合物的缩合物和至少一种选自金属化合物和无机胶体的成员组成的涂层溶液，然后在由此形成的涂层上涂覆以下物质 (B) 由至少一种选自阴离子高分子化合物、两性高分子化合物和含羟基高分子化合物组的成员组成的涂层溶液；以及具有由此形成的涂层的聚合容器。根据这种方法，可有效防止聚合物垢沉积在聚合容器的内壁等处。
• Positive type photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0445819B1

  公开（公告）日：2001-08-22