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N,N-Diethyltrifluorsilylamin | 28245-37-6

中文名称
——
中文别名
——
英文名称
N,N-Diethyltrifluorsilylamin
英文别名
Diaethyl-trifloursilyl-amin;Diethyl-trifluormethyl-amin;N-ethyl-N-trifluorosilylethanamine
N,N-Diethyltrifluorsilylamin化学式
CAS
28245-37-6
化学式
C4H10F3NSi
mdl
——
分子量
157.211
InChiKey
ZSRLQMZAHDKKBX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    77.8±23.0 °C(Predicted)
  • 密度:
    1.021±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.67
  • 重原子数:
    9
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    3.2
  • 氢给体数:
    0
  • 氢受体数:
    4

反应信息

  • 作为反应物:
    描述:
    N,N-Diethyltrifluorsilylamin二乙胺 反应 24.0h, 生成 Bis(diethylamino)difluorsilan
    参考文献:
    名称:
    Reactions of Difluorosilylene with Amines, Phosphines and Halomethanes The First Evidence of the Insertion of Difluorosilylene into Tetrafluorosilane
    摘要:
    AbstractThe reactions of SiF2/SiF4 with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et3N, HNEt2, PR3, PR2Cl), SiF2 inserts initially into SiF4 to form Si2F6, which was followed by subsequent reactions leading to products containing SiF3 groups. This is the first report of the insertion of SiF2 into SiF4. When the reactants were a weaker base (such as RPCl2, CX3Br, X=F, Cl), insertion of SiF2 into P‐Cl and C‐Br bonds became predominant.
    DOI:
    10.1002/jccs.199900061
  • 作为产物:
    描述:
    三甲基硅烷基二乙胺 在 silicon tetrafluoride 作用下, 生成 N,N-Diethyltrifluorsilylamin
    参考文献:
    名称:
    NMR spectra of some fluorosilyl amines
    摘要:
    DOI:
    10.1016/0584-8539(71)80099-5
  • 作为试剂:
    描述:
    6-溴咪唑并[1,2-a]吡啶-3-甲醛N,N-Diethyltrifluorsilylamin 作用下, 以 二氯甲烷 为溶剂, 以36.6 %的产率得到6-bromo-3-(difluoromethyl)imidazo[1,2-a]pyridine
    参考文献:
    名称:
    [EN] 7H-PYRROLO[2,3-D]PYRIMIDINES AND PREPARATION AS DYRK1A INHIBITORS
    [FR] 7H-PYRROLO[2, 3-D]PYRIMIDINES ET LEUR PRÉPARATION ET LEURS UTILISATIONS
    摘要:
    7H-Pyrrolo[2,3-d]pyrimidine compounds of Formula (I) for treating various diseases and pathologies are disclosed. More particularly, the present disclosure concerns the use of 7H-pyrrolo[2,3-d]pyrimidine compounds or analogs thereof, in the treatment of disorders characterized by overexpression of DYRKIA (e.g., cancer, Down syndrome, Alzheimer's disease, diabetes, viral infections, and osteoarthritis).
    公开号:
    WO2023064361A1
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文献信息

  • Silicon–nitrogen compounds. Part X. Dehydrofluorination of tetrafluorosilane–amine adducts with anionic hydrides and related compounds
    作者:Mellis Allan、Bernard J. Aylett、Ian A. Ellis、Christopher J. Porritt
    DOI:10.1039/dt9730002675
    日期:——
    Adducts of tetrafluorosilane and secondary amines NHR2(R = Me or Et) react, especially when an excess of tetrafluorosilane is present, with the following dehydrofluorinating agents: LiAlH4(200°); NaBH4(200°); B2H6(190–200°); electropositive metals (350°). The products are corresponding substituted aminofluoro-silanes SiF4–n(NR2)n, (R = Me, n= 1 or 2; R= Et, n= 1). Tetrafluorosilane slowly reacts at
    四氟硅烷的加合物和仲胺NHR 2(R = Me或Et)反应,特别是当过量的四氟硅烷的存在时,用下面的脱氟化氢剂:的LiAlH 4(200℃); NaBH 4(200°); B 2 H 6(190–200°);正电金属(350°)。产物是相应的取代氨基氟硅烷SiF 4 – n(NR 2)n(R = Me,n = 1或2;R = Et,n = 1)。四氟硅烷在液态NHMe 2中与碱金属在25°缓慢反应,生成SiF 2(NMe 2)2。类似地,SiF 4和伯胺在与LiAlH 4(或在某些情况下为NaBH 4)加热时,会产生相应的N-取代的六氟二硅氮烷(SiF 3) 2 NR(R = H,Me,Et,Ph或NMe 2)。在某些情况下,可以获得部分取代的SiF 3 NHR或缩合SiF 3 NR(SiF 2 NR) n SiF 3衍生物的证据。SiF 4 –NH 2 R–B 2 H 6反应的主要或唯一产物是硼唑B
  • Silicon–nitrogen compounds. Part IX. Self-dehydrofluorination of tetrafluorosilane–amine adducts as a route to substituted aminofluorosilanes
    作者:B. J. Aylett、I. A. Ellis、C. J. Porritt
    DOI:10.1039/dt9730000083
    日期:——
    if an excess of SiF4 is present. Entirely gaseous SiF4–amine mixtures do not react under these conditions: a liquid phase must be present for high yields. I.r., mass, and n.m.r. spectra of the new compounds are discussed. Tetrafluorogermane and diethylamine do not react in a gas–liquid system at 130 °C.
    四氟硅烷和仲胺的加合物在适度加热下容易经历自脱氢氟化作用,以挥发性产物形式生成取代的氨基氟硅烷,SiF 3 NR 2(R = Me,Et,Pr n,Bu n ; R 2 = C 4 H 8,C 5 H 10)。伯胺类似的加合物较不容易产生二硅氮烷(SiF 3)2 NR(R = Pr n,Bu n,Bu s)或甲硅烷基胺SiF 3 NHBu t。如果SiF 4过量,则产率会增加存在。在这些条件下,完全为气态的SiF 4-胺混合物不会发生反应:必须存在液相才能获得高收率。讨论了新化合物的Ir,质量和nmr光谱。四氟锗烷和二乙胺在130°C的气液体系中不发生反应。
  • BECKERS, H.;BURGER, H.;EUJEN, R., Z. ANORG. UND ALLG. CHEM., 563,(1988) N 8, C. 38-47
    作者:BECKERS, H.、BURGER, H.、EUJEN, R.
    DOI:——
    日期:——
  • Reactions of Difluorosilylene with Amines, Phosphines and Halomethanes The First Evidence of the Insertion of Difluorosilylene into Tetrafluorosilane
    作者:Chih-Wei Chang、Chao-Shiuan Liu、Chi-Young Lee
    DOI:10.1002/jccs.199900061
    日期:1999.6
    AbstractThe reactions of SiF2/SiF4 with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et3N, HNEt2, PR3, PR2Cl), SiF2 inserts initially into SiF4 to form Si2F6, which was followed by subsequent reactions leading to products containing SiF3 groups. This is the first report of the insertion of SiF2 into SiF4. When the reactants were a weaker base (such as RPCl2, CX3Br, X=F, Cl), insertion of SiF2 into P‐Cl and C‐Br bonds became predominant.
  • NMR spectra of some fluorosilyl amines
    作者:W. Airey、G.M. Sheldrick、B.J. Aylett、I.A. Ellis
    DOI:10.1016/0584-8539(71)80099-5
    日期:1971.8
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