bis(chloromethylsilyl)amine | 113996-28-4

• 分子结构分类: 有机化合物 - 有机金属化合物 - 有机类金属化合物
• 英文名称: bis(chloromethylsilyl)amine
• 英文别名: 1,3-dichloro 1,3-dimethyl disilazane；[Chloro-[[chloro(methyl)silyl]amino]silyl]methane；[chloro-[[chloro(methyl)silyl]amino]silyl]methane
• CAS: 113996-28-4
• 化学式: C₂H₉Cl₂NSi₂
• 分子量: 174.177
• InChiKey: VCEUVMODFGIWFU-UHFFFAOYSA-N

物化性质

• 沸点：
  41 °C(Press: 4 Torr)

计算性质

• 辛醇/水分配系数(LogP)：
  0.75
• 重原子数：
  7
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  bis(chloromethylsilyl)amine 在 lithium aluminium tetrahydride 作用下， 以 乙醚 为溶剂， 反应 0.25h， 以24%的产率得到tris-(monomethylsilyl)amine
  参考文献：
  名称：

  Synthesis and chemical properties of 1,3-dichloro-1,3-dihydridodisilazanes

  摘要：

  A trans-silylation route to 1,3-dichloro-1,3-dihydridodisilazanes, a novel class of polyfunctional disilazane, is described. Thus, heating hexamethyl- or heptamethyl-disilazane under reflux in the presence of an excess of dichlorohydrogenosilane R(1)SiHCl(2), led to compounds of formula (R(1)ClHSi)(2)NR(2)(R(1) = Me, Et, Vi or Ph and R(2) = H; R(1) = Me and R(2) = Me) in high yield. The exchange of chlorinated organosilicon moieties was strongly facilited by a catalytic amount of((n)Bu(4)N)F. Interpretation of the results and a few chemical properties of these novel disilazanes are reported.

  DOI：

  10.1016/0022-328x(94)85021-6
• 作为产物：
  描述：

  甲基二氯硅烷 在 六甲基二硅氮烷 作用下， 反应 3.0h， 生成 bis(chloromethylsilyl)amine
  参考文献：
  名称：

  COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME

  摘要：

  提供了一种用于沉积含三硅氨化合物的含硅薄膜的组合物及其制备方法，更具体地说，提供了一种用于沉积含三硅氨化合物的含硅薄膜的组合物，其能够在低温下以非常高的沉积速率形成含硅薄膜，可用作含硅薄膜的前体和显示器的封装材料，并提供了一种使用该组合物制备含硅薄膜的方法。

  公开号：

  US20200361966A1

文献信息

• Bis(chloromethylsilyl)amine and bis(chloromethylsilyl)methylamine; preparation, reactivity and spectroscopic studies of their stereoisomers and conformers ‡
  作者：Holger Fleischer、Donald C. McKean、Colin R. Pulham、Michael Bühl

  DOI：10.1039/a708220g

  日期：——

  The compounds NH(SiHMeCl)2 1 and NMe(SiHMeCl)2 2 have been prepared by treating SiHMeCl2 with CaCl2·8NH3 and NH2Me respectively. Each was characterised by elemental analysis, mass spectrometry, NMR and IR spectroscopy. Dipole moments were also measured. The NMR spectra indicate that both compounds form 1∶1 mixtures of the rac and meso diastereomers, their abundances corresponding to a statistically controlled synthetic pathway. The NMR and mass spectra also show that 1,5-dichloro-1,2,3,4,5-pentamethyltrisilazane, SiHMe[NMe(SiHMeCl)]2 3, which is formed as a side product in the synthesis of 2, also consists of two diastereomers. Variable-temperature 1H NMR spectra of NH(SiHMeCl)2 indicate participation of H(N) in hydrogen bonding. The compound is decomposed by heat and reacts with pyridine to form NH4Cl, SiHMeCl2 and polysilazanes, whereas NMe(SiHMeCl)2 shows only slight decomposition up to 80 °C and does not react with pyridine. Infrared spectra in the ν(SiH) region are interpreted in terms of the results of ab initio calculations of frequency, intensity and conformer abundance. The two bands near 2200 cm–1 in the spectrum of 2 have their origin in two effects: different orientations of the Si–H bonds relative to the Si–N–Si plane in several conformers and an unprecedented strong dipole–dipole coupling between the two Si–H bond stretching motions in situations where the bonds are roughly parallel. The absence of such an observed splitting for 1 is likely to be due in part to signal averaging during a free internal rotation. Significant couplings are also calculated to occur between Si–Cl bond-stretching motions, whose source must be different from that for the Si–H bond stretches.

  分别用CaCl2·8NH3和NH2Me处理SiHMeCl2，制备了化合物NH(SiHMeCl)2 1 和NMe(SiHMeCl)2 2 。每一种都通过元素分析、质谱、核磁共振和红外光谱进行了表征。还测量了偶极矩。 NMR 谱表明，两种化合物均形成外消旋和内消旋非对映异构体的 1→1 混合物，它们的丰度对应于统计控制的合成途径。 NMR和质谱还表明，1,5-二氯-1,2,3,4,5-五甲基三硅氮烷，SiHMe[NMe(SiHMeCl)]2 3，它是在2的合成中作为副产物形成的，也由两种非对映异构体组成。 NH(SiHMeCl)2 的变温 1H NMR 谱表明 H(N) 参与氢键结合。该化合物受热分解，与吡啶反应生成NH4Cl、SiHMeCl2和聚硅氮烷，而NMe(SiHMeCl)2在80℃以下仅表现出轻微分解，并且不与吡啶反应。 Δ(SiH) 区域的红外光谱根据频率、强度和构象异构体丰度的从头计算结果进行解释。 2 的光谱中 2200 cm-1 附近的两个谱带源于两种效应：在几个构象异构体中 Si-H 键相对于 Si-N-Si 平面的不同方向，以及前所未有的强偶极子。在键大致平行的情况下，两个 Si–H 键拉伸运动之间的偶极耦合。没有观察到 1 的这种分裂可能部分是由于自由内旋转期间的信号平均。还计算出 Si–Cl 键拉伸运动之间发生了显着的耦合，其来源必须与 Si–H 键拉伸运动不同。
• [EN] NOVEL AMINO-SILYL AMINE COMPOUND, METHOD FOR PERPARING THE 'SAME AND SILICON-CONTAINING THIN-FILM USING THE SAME<br/>[FR] NOUVEAU COMPOSÉ AMINO-SILYL AMINE, SON PROCÉDÉ DE PRÉPARATION ET FILM MINCE CONTENANT DU SILICIUM L'UTILISANT
  申请人：DNF CO LTD

  公开号：WO2014196827A3

  公开（公告）日：2015-04-23
• BACQUE, ERIC;DUNOGUES, JACQUES;BIRAN, CLAUDE;OLRY, PIERRE;PILLOT, JEAN-PA+
  作者：BACQUE, ERIC、DUNOGUES, JACQUES、BIRAN, CLAUDE、OLRY, PIERRE、PILLOT, JEAN-PA+

  DOI：——

  日期：——
• Synthesis and chemical properties of 1,3-dichloro-1,3-dihydridodisilazanes
  作者：Eric Bacqué、Jean-Paul Pillot、M. Birot、J. Dunoguès、G. Bourgeois、M. Pétraud

  DOI：10.1016/0022-328x(94)85021-6

  日期：1994.11

  A trans-silylation route to 1,3-dichloro-1,3-dihydridodisilazanes, a novel class of polyfunctional disilazane, is described. Thus, heating hexamethyl- or heptamethyl-disilazane under reflux in the presence of an excess of dichlorohydrogenosilane R(1)SiHCl(2), led to compounds of formula (R(1)ClHSi)(2)NR(2)(R(1) = Me, Et, Vi or Ph and R(2) = H; R(1) = Me and R(2) = Me) in high yield. The exchange of chlorinated organosilicon moieties was strongly facilited by a catalytic amount of((n)Bu(4)N)F. Interpretation of the results and a few chemical properties of these novel disilazanes are reported.
• COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM USING THE SAME
  申请人：DNF CO., LTD.

  公开号：US20200361966A1

  公开（公告）日：2020-11-19

  Provided are a composition for depositing a silicon-containing thin film containing a trisilylamine compound and a method for producing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film containing a trisilylamine compound which is capable of forming a silicon-containing thin film at a very high deposition rate at a low temperature to be usable as a precursor of a silicon-containing thin film and an encapsulant of a display, and a method for producing a silicon-containing thin film by using the same.

  提供了一种用于沉积含三硅氨化合物的含硅薄膜的组合物及其制备方法，更具体地说，提供了一种用于沉积含三硅氨化合物的含硅薄膜的组合物，其能够在低温下以非常高的沉积速率形成含硅薄膜，可用作含硅薄膜的前体和显示器的封装材料，并提供了一种使用该组合物制备含硅薄膜的方法。