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bis-(4-hydroxy-2-methyl-phenyl)-(4-hydroxy-phenyl)-methane | 48200-97-1

中文名称
——
中文别名
——
英文名称
bis-(4-hydroxy-2-methyl-phenyl)-(4-hydroxy-phenyl)-methane
英文别名
Bis-(4-hydroxy-2-methyl-phenyl)-(4-hydroxy-phenyl)-methan;4-[(4-Hydroxy-2-methylphenyl)-(4-hydroxyphenyl)methyl]-3-methylphenol
bis-(4-hydroxy-2-methyl-phenyl)-(4-hydroxy-phenyl)-methane化学式
CAS
48200-97-1
化学式
C21H20O3
mdl
——
分子量
320.388
InChiKey
WUNWQKMKLAWAJJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5
  • 重原子数:
    24
  • 可旋转键数:
    3
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    60.7
  • 氢给体数:
    3
  • 氢受体数:
    3

反应信息

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文献信息

  • Advanced epoxy resins prepared from triglycidyl ethers and dihydric phenols
    申请人:THE DOW CHEMICAL COMPANY
    公开号:EP0234411A1
    公开(公告)日:1987-09-02
    Advanced epoxy resin products are prepared by reacting a triglycidyl ether of a trihydric phenol such as the triglycidyl ether of 1,1,1-tri(hydroxyphenyl)methane with a dihydric phenol such as bisphenol A. These advanced epoxy resins are non-sintering solid resins useful in the preparation of electrical potting or molding compositions.
    高级环氧树脂产品是由三水酚(如 1,1,1-三(羟基苯基)甲烷的三缩水甘油醚)的三缩水甘油醚与二水酚(如双酚 A)反应制备而成。
  • Phenolic-hydroxyl-group-containing novolac resin and resist film
    申请人:DIC Corporation
    公开号:US10577449B2
    公开(公告)日:2020-03-03
    There are provided a phenolic-hydroxyl-group-containing novolac resin and resist film that are excellent in developability, heat resistance, and conformability to substrates. The phenolic-hydroxyl-group-containing novolac resin is a polycondensate of which the essential reactive components are a phenolic-hydroxyl-group-containing compound (A) represented by Structural Formula (1) [where Ar is a structural part represented by Structural Formula (Ar-1) or (Ar-2), a phenolic-hydroxyl-group-containing compound (B) represented by Structural Formula (2) [where R3 is an aliphatic hydrocarbon group having 4 to 20 carbon atoms, and j is an integer from 1 to 3], and an aldehyde compound (C).
    本发明提供了一种酚羟基酚醛树脂和抗蚀剂薄膜,它们具有优异的显影性、耐热性和对基材的顺应性。含酚羟基酚醛树脂是一种缩聚物,其主要活性成分是由结构式(1)代表的含酚羟基化合物(A)[其中 Ar 是由结构式(Ar-1)或(Ar-2)代表的结构部分、由结构式(2)代表的含酚羟基化合物(B)[其中 R3 是具有 4 至 20 个碳原子的脂族烃基,j 是 1 至 3 的整数],以及醛化合物(C)。
  • Developing solution and method of forming polyimide pattern by using the developing solution
    申请人:Yoshiaki Kawamonzen
    公开号:US20010006767A1
    公开(公告)日:2001-07-05
    Disclosed is a developing solution for a photosensitive polyimide, which consists of an aqueous solution of an amine compound having a base dissociation index pKb [=−log (Kb)=−log (Kw/Ka)=14−pKa, where Kb is a base dissociation constant, Ka is acid dissociation constant of a proton complex, pKa is an acid dissociation index of a proton complex=−log (Ka), and Kw is an ion product of water=1×10 −14 ] of 5 to 8 within an aqueous solution of 25° C.
    本发明公开了一种用于感光聚酰亚胺的显影液,它由一种胺化合物的水溶液组成,该胺化合物的碱解离指数为 pKb [=-log (Kb)=-log (Kw/Ka)=14-pKa,其中 Kb 是碱解离常数,Ka 是质子络合物的酸解离常数,pKa 是质子络合物的酸解离指数=-log (Ka),Kw 是水的离子积=1×10 -14 ]在 25° C 的水溶液中为 5 至 8。
  • MODIFIED NOVOLAC PHENOL RESIN, RESIST MATERIAL, COATING FILM, AND RESIST PERMANENT FILM
    申请人:DIC CORPORATION
    公开号:US20160017083A1
    公开(公告)日:2016-01-21
    The present invention provides a modified novolac phenol resin having excellent developability and heat resistance, a method for producing the same, a photosensitive composition, a resist material, and a permanent film. The modified novolac phenol resin has a molecular structure in which hydrogen atoms of phenolic hydroxyl groups possessed by a novolac phenol resin (C) are partially or entirely substituted by acid dissociable groups, the novolac phenol resin (C) being produced by condensing an aromatic compound (A) represented by structural formula (1) below with an aldehyde compound (B).
  • PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM
    申请人:DIC Corporation
    公开号:US20180134834A1
    公开(公告)日:2018-05-17
    There are provided a phenolic-hydroxyl-group-containing novolac resin and resist film that are excellent in developability, heat resistance, and conformability to substrates. The phenolic-hydroxyl-group-containing novolac resin is a polycondensate of which the essential reactive components are a phenolic-hydroxyl-group-containing compound (A) represented by Structural Formula (1) [where Ar is a structural part represented by Structural Formula (Ar-1) or (Ar-2), a phenolic-hydroxyl-group-containing compound (B) represented by Structural Formula (2) [where R 3 is an aliphatic hydrocarbon group having 4 to 20 carbon atoms, and j is an integer from 1 to 3], and an aldehyde compound (C).
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