1,1,3,3-Tetrafluoro-3-piperidin-1-ylsulfonylpropane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 哌啶类
• 英文名称: 1,1,3,3-Tetrafluoro-3-piperidin-1-ylsulfonylpropane-1-sulfonic acid
• 英文别名: 1,1,3,3-tetrafluoro-3-piperidin-1-ylsulfonylpropane-1-sulfonic acid
• 化学式: C₈H₁₃F₄NO₅S₂
• 分子量: 343.3
• InChiKey: JKNPCTQOWZADHI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  109
• 氢给体数：
  1
• 氢受体数：
  10

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20140186771A1

  公开（公告）日：2014-07-03

  A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R 1 is a hydrogen atom, a fluorine atom, or the like. R 2 is a hydrogen atom or a monovalent hydrocarbon group. R 3 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 4 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 5 is a hydrogen atom, a monovalent chain hydrocarbon group, or the like. R 6 is a monovalent chain hydrocarbon group. R 6 is bonded to R 3 to form a first alicyclic structure, or R 6 is bonded to R 5 to form a second alicyclic structure. At least one hydrogen atom of R 2 , R 3 , or R 4 is optionally substituted with a fluorine atom.

  一种辐射敏感树脂组合物，包括聚合物，该聚合物包括由式（1）表示的结构单元和酸发生剂。其中R1为氢原子、氟原子或类似物。R2为氢原子或一价碳氢基团。R3为氢原子、一价链状碳氢基团或类似物。R4为氢原子、一价链状碳氢基团或类似物。R5为氢原子、一价链状碳氢基团或类似物。R6为一价链状碳氢基团。R6与R3结合形成第一脂环结构，或R6与R5结合形成第二脂环结构。R2、R3或R4中的至少一个氢原子可以被氟原子取代。
• ACID DIFFUSION CONTROL AGENT, RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD
  申请人：JSR CORPORATION

  公开号：US20150079520A1

  公开（公告）日：2015-03-19

  An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R 1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R 2 and R 3 each independently represent a monovalent hydrocarbon group, or the like. R 4 and R 5 each independently represent a monovalent hydrocarbon group, or the like. R 6 and R 7 each independently represent a monovalent hydrocarbon group, or the like. R 8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R 9 represents a monovalent hydrocarbon group, or the like. R 10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R 11 and R 12 each independently represent a monovalent hydrocarbon group, or the like. R 13 and R 14 each independently represent a monovalent hydrocarbon group, or the like.

  一种酸扩散控制剂包括由公式（1）表示的化合物，由公式（2）表示的化合物或两者的混合物。其中，R1代表包括单价脂环结构或类似结构的烃基。R2和R3各自独立地代表单价烃基或类似物。R4和R5各自独立地代表单价烃基或类似物。R6和R7各自独立地代表单价烃基或类似物。R8代表与酯基和碳原子一起形成的单环杂环基。n为1至6的整数。R9代表单价烃基或类似物。R10代表具有1至10个碳原子的单价烃基。R11和R12各自独立地代表单价烃基或类似物。R13和R14各自独立地代表单价烃基或类似物。
• RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER
  申请人：JSR CORPORATION

  公开号：US20160185999A1

  公开（公告）日：2016-06-30

  A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R 1 to R 4 has the fluorine atom or a group including the fluorine atom. R 5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

  一种树脂组合物，包括聚合物和溶剂。该聚合物包括一个结构单元，该结构单元包括由公式（1）表示的基团，其中在公式（1）中，R1至R4分别独立地表示氢原子、氟原子或具有1至20个碳原子的单价有机基团，其中至少有一个R1至R4包括氟原子或包括氟原子的基团。R5表示具有1至7个碳原子的取代或未取代的三价链烃基团。*表示与结构单元的其他部分结合的位点。该结构单元最好由公式（2-1）至（2-3）中的任何一个表示。在公式（2-1）至（2-3）中，Z表示由公式（1）表示的基团。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：JSR CORPORATION

  公开号：US20150355539A1

  公开（公告）日：2015-12-10

  A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R 1 represents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. M + represents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by R 1 is preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by R 1 is preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by M + is preferably represented by the formula (X).

  一种辐射敏感的树脂组合物，包括聚合物，其中包括一个结构单元，其中包括一个酸敏感基团；以及由公式（1）表示的化合物。R1表示具有1到30个碳原子的一价有机基团。L表示单键，氧原子或硫原子。M+表示一价放射性光敏离子。R1表示的一价有机基团最好是一价烃基或一价氟代烃基，而L最好表示单键。R1表示的一价有机基团最好是一价烃基，一价氟代烃基，一价脂肪族杂环基或一价氟代脂肪族杂环基，而L最好表示氧原子或硫原子。M+表示的一价放射性光敏离子最好由公式（X）表示。
• US9465291B2
  申请人：——

  公开号：US9465291B2

  公开（公告）日：2016-10-11