Cyclohexyl 2-fluoro-3,3-bis(trifluoromethylsulfonyl)propanoate

• 分子结构分类: 有机化合物 - 有机硫化合物 - 磺酰类
• 英文名称: Cyclohexyl 2-fluoro-3,3-bis(trifluoromethylsulfonyl)propanoate
• 英文别名: cyclohexyl 2-fluoro-3,3-bis(trifluoromethylsulfonyl)propanoate
• 化学式: C₁₁H₁₃F₇O₆S₂
• 分子量: 438.3
• InChiKey: DAMNHAYGCJRSQV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  26
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  111
• 氢给体数：
  0
• 氢受体数：
  13

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20150338736A1

  公开（公告）日：2015-11-26

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R 1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X 1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X 1 may be bonded to R 1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)
• [EN] ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN<br/>[FR] COMPOSITION DE RÉSINE ET FILM SENSIBLES AUX RAYONS ACTINIQUES OU À LA RADIATION ACTINIQUE ET PROCÉDÉ DE FORMATION DE MOTIF
  申请人：FUJIFILM CORP

  公开号：WO2014104400A1

  公开（公告）日：2014-07-03

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)