1-Diazo-3-methyl-1-(3-methylcyclohexyl)sulfonylbutan-2-one

• 分子结构分类: 有机化合物 - 有机硫化合物 - 磺酰类
• 英文名称: 1-Diazo-3-methyl-1-(3-methylcyclohexyl)sulfonylbutan-2-one
• 英文别名: 1-diazo-3-methyl-1-(3-methylcyclohexyl)sulfonylbutan-2-one
• 化学式: C12H20N2O3S
• 分子量: 272.37
• InChiKey: UZHDESJVDHUSGY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  61.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same
  申请人：Samsung Electronics Co., Ltd.

  公开号：US20030004289A1

  公开（公告）日：2003-01-02

  An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.

  本发明公开了一种含有缩醛基团的莽草烯基共聚物，用于光刻胶组合物，以及其制备方法和包含其的光刻胶组合物。根据本发明，本发明的共聚物在不超过约250nm的波长下具有优异的透明度、优异的分辨率、优异的灵敏度、干法蚀刻抵抗力和优异的基底附着力。
• Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties
  申请人：Samsung Electronics Co., Ltd.

  公开号：EP1457821A1

  公开（公告）日：2004-09-15

  Disclosed herein are methods of making a negative pattern of carbon nanotubes or a polymerized carbon nanotube composite having interpenetrating polymer network(IPN) by modifying the surfaces of the carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups and subjecting the surface-modified carbon nanotubes either to a photolithography process or to a heatcuring process. By virtue of the present invention, desired patterns of carbon nanotubes can be easily made on the surfaces of various substrates, and polymerized carbon nanotube composites improved in hardening properties can be made without additional polymers.

  本发明公开了制作碳纳米管负图案或具有互穿聚合物网络（IPN）的聚合碳纳米管复合材料的方法，方法是用可聚合的官能团（如环氧乙烷基团和酸酐基团）修饰碳纳米管的表面，并将表面修饰的碳纳米管置于光刻工艺或热固化工艺中。通过本发明，可以很容易地在各种基底的表面上制作出所需的碳纳米管图案，并且无需额外的聚合物就可以制作出硬化性能更好的聚合碳纳米管复合材料。
• Composition for forming organic insulating film and organic insulating film formed from the same
  申请人：Samsung Electronics Co., Ltd

  公开号：EP1542241A1

  公开（公告）日：2005-06-15

  Disclosed herein are a composition for forming an organic insulating film and an organic insulating film formed from the composition. The composition comprises an insulating polymer having a maleimide structure, a crosslinking agent and a photoacid generator so as to form a crosslinked structure. The organic insulating film has excellent chemical resistance to organic solvents used in a subsequent photolithographic process and improves the electrical properties of transistors.

  本文公开了一种用于形成有机绝缘膜的组合物以及由该组合物形成的有机绝缘膜。该组合物由具有马来酰亚胺结构的绝缘聚合物、交联剂和光酸发生器组成，从而形成交联结构。有机绝缘膜对后续光刻工艺中使用的有机溶剂具有优异的耐化学性，并能改善晶体管的电气性能。
• Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same
  申请人：——

  公开号：US20030118933A1

  公开（公告）日：2003-06-26

  Disclosed is an norbornene-based copolymer for photoresist, a preparation method thereof, and a photoresist composition comprising the same. The copolymer of the present invention exhibits high transparency to light of 193 nm wavelength and an excellent etching resistance, excellent resolution due to the remarkable difference between light-exposed part and light-unexposed part in the dissolving rate and excellent adhesion to the substrate due to very hydrophilic diketone group of its own. As a result, the copolymer of the present invention is very useful as ArF exposure photoresist material in the fabrication of semiconductor devices.

  本发明公开了一种用于光刻胶的降冰片烯基共聚物、其制备方法以及包含该共聚物的光刻胶组合物。本发明的共聚物对 193 纳米波长的光具有高透明度和优异的抗蚀刻性，由于受光部分和未受光部分在溶解速率上的显著差异而具有优异的分辨率，并且由于其自身具有非常亲水的二酮基团而与基底具有优异的粘附性。因此，本发明的共聚物作为氩焰曝光光刻胶材料在半导体器件的制造中非常有用。
• Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties
  申请人：Samsung Electronics Co., Ltd.

  公开号：US20040265755A1

  公开（公告）日：2004-12-30

  Disclosed herein are methods of making a negative pattern of carbon nanotubes or a polymerized carbon nanotube composite having an interpenetrating polymer network (IPN) by modifying the surfaces of the carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups and subjecting the surface-modified carbon nanotubes either to a photolithography process or to a heatcuring process. By virtue of the present invention, desired patterns of carbon nanotubes can be easily made on the surfaces of various substrates, and polymerized carbon nanotube composites improved in hardening properties can be made without additional polymers.

  本发明公开了制作碳纳米管负图案或具有互穿聚合物网络（IPN）的聚合碳纳米管复合材料的方法，方法是用可聚合官能团（如环氧乙烷基团和酸酐基团）修饰碳纳米管表面，并将表面修饰的碳纳米管置于光刻工艺或热固化工艺中。通过本发明，可以很容易地在各种基底的表面上制作出所需的碳纳米管图案，并且无需额外的聚合物就可以制作出硬化性能更好的聚合碳纳米管复合材料。