[EN] COMPOSITIONS FOR ANTI PATTERN COLLAPSE TREATMENT COMPRISING GEMINI ADDITIVES<br/>[FR] COMPOSITIONS POUR TRAITEMENT ANTI-AFFAISSEMENT DE MOTIF COMPRENANT DES ADDITIFS GÉMINÉS
申请人:BASF SE
公开号:WO2014009847A1
公开(公告)日:2014-01-16
The use of a Gemini additive in compositions for treating semiconductor substrates is provided. The compositions are useful in processes for manufacturing integrated circuits devices, optical devices, micromachines and mechanical precision devices, in particular for developing photoresists and post etch residue removal to avoid pattern collapse.