[Diazo(propan-2-ylsulfonyl)methyl]sulfonylcyclohexane

• 分子结构分类: 有机化合物 - 有机硫化合物 - 磺酰类
• 英文名称: [Diazo(propan-2-ylsulfonyl)methyl]sulfonylcyclohexane
• 英文别名: [diazo(propan-2-ylsulfonyl)methyl]sulfonylcyclohexane
• 化学式: C10H18N2O4S2
• 分子量: 294.4
• InChiKey: CQSQZVIQVIVKSI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  87
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Sulfonium salt compound
  申请人：——

  公开号：US20040033434A1

  公开（公告）日：2004-02-19

  A compound shown by the general formula [1] 1 (wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group, Y n− is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R 1 , R 2 and R 3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.

  公式为[1]1的化合物被展示出来（其中R1、R2和R3各自独立地是芳香族碳氢残基，Yn−是源自具有3个或更多碳原子的羧酸的阴离子，其中含有取代的氟原子，n为1或2，前提是R1、R2和R3各自不是具有取代基的苯基，该取代基位于邻位和/或间位），并且由该化合物和一种二硫酰二氮化合物组成的组合物被公开。使用该化合物或该化合物作为酸发生剂用于光刻胶会产生改善超细图案轮廓或减少超细图案侧壁不规则性的效果。该化合物还可用作阳离子光聚合引发剂。
• Hybrid onium salt
  申请人：Ishihara Masami

  公开号：US20050020710A1

  公开（公告）日：2005-01-27

  The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provides a hybrid type onium salt shown by the general formula [1]: [wherein R 1 to R 3 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 1 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 1 is an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; and R 4 is an alkyl group, an alkenyl group, an aryl group or an aralkyl group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted or a group shown by the general formula [2]: (wherein R 5 to R 7 are each independently a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group or an amino group which maybe substituted; Q 2 is a direct-linkage, an oxygen atom, a sulfur atom or a lower alkylene chain; T 2 an alkylene group or an arylene group, which may have a substituent selected from the group consisting of a halogen atom, an alkyl group, a haloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group and an amino group which may be substituted; A 3 is a counter anion; m is an integer of 0 to 4; and two ns are each independently an integer of 0 to 5); A 1 and A 2 are each independently a counter anion; and m and n are the same as described above], and a polymerization initiator or an acid generator, comprising said onium salt.

  本发明涉及一种杂化型离子盐，其分子中具有碘化离子盐和亚砜盐，例如，作为阳离子型光聚合引发剂和化学放大型抗蚀剂的酸发生剂有用，并提供由通式[1]所示的杂化型离子盐：[其中R1至R3分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q1是直链、氧原子、硫原子或较低的烷基链；T1是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；R4是烷基、烯丙基、芳基或芳基烷基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基或由通式[2]所示的基：（其中R5至R7分别独立地是卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基或氨基，可被取代；Q2是直链、氧原子、硫原子或较低的烷基链；T2是烷基或芳基，可具有从卤素原子、烷基、卤代烷基、芳基、烷氧基、芳氧基、烷硫基、芳硫基和可被取代的氨基中选择的取代基；A3是一个对离子；m是0到4的整数；两个n各自独立地是0到5的整数）；A1和A2各自独立地是一个对离子；m和n与上述描述相同]，以及包含该离子盐的聚合引发剂或酸发生剂。
• Sulfonium salt compounds
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1113005B1

  公开（公告）日：2003-08-06
• HYBRID ONIUM SALT
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1443042B1

  公开（公告）日：2008-08-13
• SULFONIUM SALT COMPOUND
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1314725B1

  公开（公告）日：2008-03-19