4-Tert-butyl-2-[(4-tert-butyl-4,5-dihydro-1,3-oxazol-2-yl)methyl]-4,5-dihydro-1,3-oxazole

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑啉类
• 英文名称: 4-Tert-butyl-2-[(4-tert-butyl-4,5-dihydro-1,3-oxazol-2-yl)methyl]-4,5-dihydro-1,3-oxazole
• 化学式: C₁₅H₂₆N₂O₂
• 分子量: 266.38
• InChiKey: WCCCBUXURHZPQL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.87
• 拓扑面积：
  43.2
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190300498A1

  公开（公告）日：2019-10-03

  A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

  该化合物包括分子中由以下一般式（1-1）所示的两个或更多个部分结构，其中每个Ar独立地表示一个芳香环，可以具有取代基，或者是一个含有至少一个氮原子的芳香环，可以具有取代基，两个Ar可以选择地彼此连接以形成一个环结构；虚线代表与有机基团的键合；B代表一种能够由于热和酸的作用而形成反应性阳离子的阴离子离去基团。这提供了一种能够在空气或惰性气体中的成膜条件下固化而不形成副产物的化合物，并形成具有良好干法刻蚀耐久性的有机底层膜，在衬底加工过程中不仅具有填隙和平坦化在衬底上形成的图案的优异特性。
• METHOD OF PRODUCING 6,6-DIMETHYL-3-OXABICYCLO[3.1.0]HEXAN-2-ONE
  申请人：Hirata Norihiko

  公开号：US20100168463A1

  公开（公告）日：2010-07-01

  A method of producing 6,6-dimethyl-3-oxabicyclo[3.1.0]hexan-2-one comprising subjecting a cyclopropane compound of the formula (1): (wherein, R 1 represents an alkyl group, R 2 represents an alkyl group having carbon atom(s) of 1 to 10, a haloalkyl group having carbon atom(s) of 1 to 10, or an aryl group having carbon atoms of 6 to 10 optionally substituted by an alkyl group having carbon atom(s) of 1 to 10, and when R 2 represents the alkyl group, R 1 and R 2 are optionally the same or different each other.) to any of the following reactions a), b) and c): a) an acid treatment reaction after an alkali hydrolysis reaction b) an acid hydrolysis reaction c) an enzyme hydrolysis reaction , then, removing an aqueous layer.

  一种制备6,6-二甲基-3-氧杂双环[3.1.0]己烷-2-酮的方法，包括将式（1）的环丙烷化合物（其中，R1代表烷基，R2代表具有1至10个碳原子的烷基，具有1至10个碳原子的卤代烷基或具有6至10个碳原子的芳基，所述芳基可以被具有1至10个碳原子的烷基取代，当R2代表烷基时，R1和R2可以是相同的或不同的）经过以下反应之一a) 碱水解反应后的酸处理反应b) 酸水解反应c) 酶水解反应，然后去除水层。
• COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
  申请人：JSR Corporation

  公开号：EP1235104A1

  公开（公告）日：2002-08-28

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：（A）可分解化合物；（B）折射率低于可分解化合物（A）的不可分解化合物；（C）对辐射敏感的分解剂；以及（D）稳定剂。通过图案掩膜将组合物暴露在辐射下，暴露部分的上述成分（C）和（A）被分解，暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• Radiation sensitive refractive index changing composition and refractive index changing method
  申请人：JSR Corporation

  公开号：EP1323742A2

  公开（公告）日：2003-07-02

  A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

  一种辐射敏感折射率改变组合物，其材料的折射率可通过简单的方法改变，改变后的折射率差足够大，并且无论使用条件如何，都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括：(A) 可聚合化合物；(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物；(C) 辐射敏感聚合引发剂。
• RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
  申请人：JSR Corporation

  公开号：EP1350814A1

  公开（公告）日：2003-10-08

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：(A) 可分解化合物；(B) 折射率高于可分解化合物(A)的不可分解化合物；(C) 对辐射敏感的分解剂；(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下，暴露部分的上述成分（C）和（A）分解，在暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。

表征谱图