Fine pattern forming material and pattern formation process
申请人:WAKO PURE CHEMICAL INDUSTRIES LTD
公开号:EP0588544A2
公开(公告)日:1994-03-23
A resist material comprising (a) a copolymer having as a functional group
wherein R2 and R3 are, e.g. C1-6 alkyl, and R4 is, e.g. C1-10 alkyl, (b) a compound which generates an acid when exposed to electron beams, and (c) a solvent, is suitable for forming a chemical-amplified positive-working fine pattern with high resolution and good shape.