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Thiophene-2-carboxylic acid N'-(5-methyl-thiophene-2-carbonyl)-hydrazide | 525597-56-2

中文名称
——
中文别名
——
英文名称
Thiophene-2-carboxylic acid N'-(5-methyl-thiophene-2-carbonyl)-hydrazide
英文别名
5-methyl-N'-(thiophene-2-carbonyl)thiophene-2-carbohydrazide
Thiophene-2-carboxylic acid N'-(5-methyl-thiophene-2-carbonyl)-hydrazide化学式
CAS
525597-56-2
化学式
C11H10N2O2S2
mdl
——
分子量
266.345
InChiKey
JTNHJLVHTMPVFT-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.8
  • 重原子数:
    17
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.09
  • 拓扑面积:
    115
  • 氢给体数:
    2
  • 氢受体数:
    4

文献信息

  • Modulation of pathogenicity
    申请人:4 SC AG
    公开号:US20040063765A1
    公开(公告)日:2004-04-01
    The present invention relates to the use of compounds of the general Formula (I): 1 wherein in Formula (I), R is H, alkyl, cycloalkyl, aryl or heteroaryl; R 1 is H, alkyl, cycloalkyl, aryl or heteroaryl; R 2 is H, alkyl, cycloalkyl, aryl or heteroaryl; A 1 and A 2 each independently represent an optionally substituted C 1 -C 20 -alkyl group which may contain one or more group(s) Z, or a monocyclic or polycyclic optionally substituted aromatic or non-aromatic ring system which may contain one or more group(s) X, and in case of a polycyclic ring system, said system contains at least one aromatic ring; z is selected from the group consisting of S, O, N, NR 4 , CO, CO 2 , CS, SO or SO 2 X is selected from the group consisting of S, O, N, NR 4 , SO or SO 2 ;
    本发明涉及使用一般式(I)的化合物:1其中,在式(I)中,R为氢,烷基,环烷基,芳基或杂芳基;R1为氢,烷基,环烷基,芳基或杂芳基;R2为氢,烷基,环烷基,芳基或杂芳基;A1和A2各自独立地表示可选取代的C1-C20烷基,其中可以含有一个或多个Z基团,或者是一个单环或多环可选取代的芳香或非芳香环系,其中可以含有一个或多个X基团,在多环环系的情况下,该环系至少含有一个芳香环;z选自S、O、N、NR4、CO、CO2、CS、SO或SO2;X选自S、O、N、NR4、SO或SO2。
  • Method and compositions suitable for treatment of wounds
    申请人:QuoNova Europe GmbH
    公开号:EP2100602A1
    公开(公告)日:2009-09-16
    Compositions for the treatment of areas of compromised skin integrity as well as pharmaceutical preparations and medicaments containing them are provided. Methods of treatment and prevention of microbial damages and diseases, in particular for diseases of compromised skin integrity where there is an advantage in inhibiting quorum sensing regulated phenotypes of pathogens is also provided.
    本研究提供了用于治疗皮肤完整性受损部位的组合物以及含有这些组合物的药物制剂和药品。还提供了治疗和预防微生物损害和疾病的方法,特别是在抑制病原体的法定量传感调控表型方面具有优势的皮肤完整性受损疾病。
  • Modulation of pathogcnicity
    申请人:Ammendola Aldo
    公开号:US20080194588A1
    公开(公告)日:2008-08-14
    The present invention relates to the use of compounds of the general Formula (I): wherein in Formula (I), R is H, alkyl, cycloalkyl, aryl or heteroaryl; R 1 is H, alkyl, cycloalkyl, aryl or heteroaryl; R 2 is H, alkyl, cycloalkyl, aryl or heteroaryl; A 1 and A 2 each independently represent an optionally substituted C 1 -C 20 -alkyl group which may contain one or more group(s) Z, or a monocyclic or polycyclic optionally substituted aromatic or non-aromatic ring system which may contain one or more group(s) X, and in case of a polycyclic ring system, said system contains at least one aromatic ring; Z is selected from the group consisting of S, O, N, NR 4 , CO, CO 2 , CS, SO or SO 2 X is selected from the group consisting of S, O, N, NR 4 , SO or SO 2 ;
  • Modulation of Pathogenicity
    申请人:Ammendola Aldo
    公开号:US20100280036A1
    公开(公告)日:2010-11-04
    The present invention relates to the use of compounds of the general Formula (I): wherein in Formula (I), R is H, alkyl, cycloalkyl, aryl or heteroaryl; R 1 is H, alkyl, cycloalkyl, aryl or heteroaryl; R 2 is H, alkyl, cycloalkyl, aryl or heteroaryl; A 1 and A 2 each independently represent an optionally substituted C 1 -C 20 -alkyl group which may contain one or more group(s) Z, or a monocyclic or polycyclic optionally substituted aromatic or non-aromatic ring system which may contain one or more group(s) X, and in case of a polycyclic ring system, said system contains at least one aromatic ring; Z is selected from the group consisting of S, O, N, NR 4 , CO, CO 2 , CS, SO or SO 2 X is selected from the group consisting of S, O, N, NR 4 , SO or SO 2 ;
  • US7335779B2
    申请人:——
    公开号:US7335779B2
    公开(公告)日:2008-02-26
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