diisopentyl-phosphine | 99739-98-7

• 分子结构分类: 有机化合物 - 有机磷化合物
• 英文名称: diisopentyl-phosphine
• 英文别名: Diisoamylphosphin；Diisopentyl-phosphin；Bis(3-methylbutyl)phosphane
• CAS: 99739-98-7
• 化学式: C₁₀H₂₃P
• 分子量: 174.266
• InChiKey: CPUOIRSSFBOIPB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  11
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  diisopentyl-phosphine 在 air 作用下， 生成 1-[双(3-甲基丁基)磷酰基]-3-甲基丁烷
  参考文献：
  名称：

  Hofmann,A.W., Chemische Berichte, 1873, vol. 6, p. 306

  摘要：

  DOI：
• 作为产物：
  描述：

  异戊基碘 在 phosphonium iodide 、 zinc(II) oxide 作用下， 生成 diisopentyl-phosphine
  参考文献：
  名称：

  Hofmann,A.W., Chemische Berichte, 1873, vol. 6, p. 306

  摘要：

  DOI：

文献信息

• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING
  申请人：Nakajima Makoto

  公开号：US20120315765A1

  公开（公告）日：2012-12-13

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography, includes as a silane compound, a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable organosilane is a hydrolyzable organosilane of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) Formula (1) wherein R 1 is Formula (2): in which R 4 is an organic group, and R 5 is a C 1-10 alkylene group, a hydroxyalkylene group, a sulfide bond, an ether bond, an ester bond, or a combination thereof, X 1 is Formula (3), Formula (4), or Formula (5): R 2 is an organic group, and R 3 is a hydrolysable group.

  提供了一种用于制备可用作硬面膜的光刻胶底层膜的抗性底层膜形成组合物。一种用于光刻胶底层膜形成的抗性底层膜形成组合物，包括硅烷化合物作为成分，所述硅烷化合物是可水解的有机硅烷、其水解产物或其水解缩合物，其中所述可水解的有机硅烷是式(1)的可水解的有机硅烷： R1aR2bSi(R3)4−(a+b) 式(1) 其中R1是式(2)： 其中R4是有机基团，R5是C1-10烷基、羟基烷基、硫化键、醚键、酯键或其组合，X1是式(3)、式(4)或式(5)： R2是有机基团，R3是可水解基团。
• SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL
  申请人：Takeda Satoshi

  公开号：US20130183830A1

  公开（公告）日：2013-07-18

  Described herein are compositions for forming an underlayer film for a solvent-developable resist. These compositions can include a hydrolyzable organosilane having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof and a solvent. The composition can form a resist underlayer film including, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, a hydrolysis-condensation product of the hydrolyzable organosilane, or a combination thereof, the silicon atom in the silane compound having a silicon atom bonded to an organic group containing a protected aliphatic alcohol group in a ratio of 0.1 to 40% by mol based on the total amount of silicon atoms. Also described is a method for applying the composition onto a semiconductor substrate and baking the composition to form a resist underlayer film.

  本文描述了用于形成溶剂可开发光刻胶底层膜的组合物。这些组合物可以包括一个水解性有机硅烷，其硅原子与含有受保护脂肪醇基团的有机基团结合，水解的水解性有机硅烷的水解缩合产物，或两者的组合物和溶剂。该组合物可以形成一个光刻胶底层膜，其中包括水解性有机硅烷，水解的水解性有机硅烷的水解缩合产物，或两者的组合物，硅烷化合物中的硅原子与含有受保护脂肪醇基团的有机基团的比例为总硅原子量的0.1至40%摩尔。还描述了一种将该组合物应用于半导体衬底并烘烤该组合物以形成光刻胶底层膜的方法。
• COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20150322212A1

  公开（公告）日：2015-11-12

  A resist underlayer film that can be used as a hardmask. A resist underlayer film forming composition for lithography, includes: as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1) or a hydrolyzable silane containing a combination of a hydrolyzable silane of Formula (1) with a hydrolyzable silane of Formula (2) in a content of less than 50% by mole in all silanes; Formula (1): R 1 a R 2 b Si(R 3 ) 4-(a+b) wherein R 1 is an organic group containing Formula (1-1), Formula (1-2), or Formula (1-3): a is 1 and b is an integer of 0 to 2, where a+b is an integer of 1 to 3; Formula (2): R 4 a R 5 b Si(R 6 ) 4-(a+b) wherein, R 4 is an organic group containing Formula (2-1), Formula (2-2), or Formula (2-3): a is 1 and b is an integer of 0 to 2, where a+b is an integer of 1 to 3.

  一种可用作硬掩膜的抗蚀底层膜。一种用于光刻的抗蚀底层膜形成组合物，包括：作为硅烷的，一种可水解的硅烷，其水解产物或其水解-缩合产物，其中可水解的硅烷包括公式（1）的可水解硅烷或含有公式（1）的可水解硅烷与公式（2）的可水解硅烷的组合物，其在所有硅烷中的摩尔分数小于50％；公式（1）：R1aR2bSi（R3）4-（a+b），其中R1是含有公式（1-1），公式（1-2）或公式（1-3）的有机基团：a为1，b为0到2的整数，其中a+b为1到3的整数；公式（2）：R4aR5bSi（R6）4-（a+b），其中R4是含有公式（2-1），公式（2-2）或公式（2-3）的有机基团：a为1，b为0到2的整数，其中a+b为1到3的整数。
• Catalytic systems and methods for carbonylation
  申请人：DAICEL CHEMICAL INDUSTRIES CO., LTD.

  公开号：EP0696474A2

  公开（公告）日：1996-02-14

  A carbonylation catalytic system comprises (A) a combination of (A1) a Group VIII metal source of Periodic Table of the Elements (e.g., palladium, palladium chloride) supported on a carrier, (A2) a ligand such as triphenylphosphine and (A3) an acid such as an alkyl-sulfonic acid, or (B) a combination of (B1) the Group VIII metal source except for palladium (e.g., a platinum compound), (B2) a ligand such as triphenylphosphine and (B3) an electron donative compound having an electron donability ΔνD of not less than 2 (for instance, an amine such as a heterocyclic tertiary amine). The catalytic system (B) may further comprise (B4) an acid such as methanesulfonic acid. In the presence of the catalytic system (A) or (B), an acetylenic or olefinic unsaturated compound is allowed to react with carbon monoxide and a nucleophilic compound having an active hydrogen such as water, an alcohol and a carboxylic acid in a liquid phase to give an unsaturated or saturated carboxylic acid or an ester thereof with high transformation rate and selectivity.

  一种羰基化催化体系包括(A) (A1)支撑在载体上的元素周期表第八族金属源（如钯、氯化钯）、(A2)配体（如三苯基膦）和(A3)酸（如烷基磺酸）的组合，或(B) (B1)除钯以外的第八族金属源（如铂化合物）、(B2)配体（如三苯基膦）和(B3)电子捐献化合物（电子捐献率ΔνD不小于2实例）的组合、铂化合物）、(B2) 三苯基膦等配体和 (B3) 电子捐赠性 ΔνD 不小于 2 的电子捐赠化合物（例如，杂环叔胺等胺）的组合。催化体系 (B) 可进一步包括 (B4) 酸，如甲磺酸。在催化体系（A）或（B）的存在下，乙炔基或烯烃基不饱和化合物可与一氧化碳和具有活泼氢的亲核化合物（如水、醇和羧酸）在液相中发生反应，以高转化率和高选择性得到不饱和或饱和羧酸或其酯。
• A method for quantitatively determining creatine kinase and a reagent therefor
  申请人：KYOWA MEDEX CO., LTD.

  公开号：EP0774514A1

  公开（公告）日：1997-05-21

  The object of the invention is to provide a reagent for quantitatively determining creatine kinase with improved storability in liquid form as well as a method for quantitatively determining creatine kinase with stable measurements. Disclosed are a method for quantitatively determining creatine kinase, which comprises activating creatine kinase in a sample in an aqueous medium in coexistence with a trivalent phosphorus compound and a sulfhydryl-containing compound and then determining creatine kinase activity; a method for stabilizing a sulfhydryl-containing compound, which comprises allowing a trivalent phosphorus compound to coexist with a sulfhydryl-containing compound; and a reagent for quantitatively determining creatine kinase, which comprises a trivalent phosphorus compound, a sulfhydryl-containing compound, and a reaction substrate for creatine kinase.

  本发明的目的是提供一种定量测定肌酸激酶的试剂，该试剂具有更好的液态贮存性，以及一种定量测定肌酸激酶的方法，其测量结果稳定。本发明公开了一种定量测定肌酸激酶的方法，该方法包括在水介质中与三价磷化合物和含巯基化合物共存，激活样品中的肌酸激酶，然后测定肌酸激酶活性；一种稳定含巯基化合物的方法，包括使三价磷化合物与含巯基化合物共存；以及一种定量测定肌酸激酶的试剂，包括三价磷化合物、含巯基化合物和肌酸激酶的反应底物。