The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.
A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group:
wherein R
1
represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R
2
represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R
3
represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
本发明涉及一种阳性光敏
树脂前体组合物,该组合物在曝光后具有良好的贮存稳定性。
光敏
树脂前体组合物包括:(a) 主要由式(1)表示的结构单元组成的聚合物;(b) 至少两个光酸发生器;和(c) 具有烷氧基甲基的化合物:
其中 R
1
代表价数为 2 至 8 的有机基团,至少有两个碳原子; R
2
代表价数为 2-6 的有机基团,至少有两个碳原子; R 2
3
代表氢或碳原子数在 1 至 20 之间的有机基团;n 代表 10 至 100,000 之间的数字;m 代表 0 至 2 之间的整数;p 和 q 代表 0 至 4 之间的整数,且满足 p+q>0 的条件。