4,4'-(2,2,2-Trifluoro-1-phenylethane-1,1-diyl)dibenzoic acid | 918933-54-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4'-(2,2,2-Trifluoro-1-phenylethane-1,1-diyl)dibenzoic acid
• 英文别名: 4-[1-(4-carboxyphenyl)-2,2,2-trifluoro-1-phenylethyl]benzoic acid
• CAS: 918933-54-7
• 化学式: C₂₂H₁₅F₃O₄
• 分子量: 400.3
• InChiKey: GBDPXXNDTMQBMG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.5
• 重原子数：
  29
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  7

文献信息

• Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：US20200392079A1

  公开（公告）日：2020-12-17

  This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.

  这种化合物具有优异的溶剂溶解性和与树脂的兼容性，可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式（1）表示，其中在公式（1）中，R1、R2、R3、R5和R6代表羟基或烷氧基；R4分别表示含硫醚键的有机基团；R7和R9分别代表氢原子或1至4个碳的烷基基团；R8代表烷基或芳基；X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物；一种光敏树脂组合物可以包括上述光聚合引发剂，从中可以得到高灵敏度且无金属腐蚀的固化产物。
• NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
  申请人：TOKYO UNIVERSITY OF SCIENCE FOUNDATION

  公开号：US20180370908A1

  公开（公告）日：2018-12-27

  The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

  本发明的目的是提供一种新的化合物，该化合物可以在受到活性能量射线照射时产生碱和自由基；一种包含该新化合物的光聚合引发剂；以及一种含有光聚合引发剂的光敏树脂组合物，该组合物具有高灵敏度和良好的储存稳定性，并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式（1）表示：（其中，R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等；X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基；n表示1至6的整数）。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
  申请人：Katayama Mami

  公开号：US20120070781A1

  公开（公告）日：2012-03-22

  An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

  本发明的目的是提供一种具有灵敏度并适用于广泛应用的基础发生器，以及一种光敏树脂组合物，由于聚合物前体的结构在碱性物质的促进下或在碱性物质存在下加热反应成最终产物，因此适用于广泛的应用范围。基础发生器通过电磁辐射和加热生成碱性物质。光敏树脂组合物包括聚合物前体，其在基础发生器和碱性物质的促进下或在碱性物质存在下加热反应成最终产物。
• Polyamide mit Hexafluorisopropyliden-gruppen, diese enthaltende positiv arbeitende lichtempfindliche Gemische und damit hergestellte Aufzeichnungsmaterialien
  申请人：HOECHST CELANESE CORPORATION

  公开号：EP0264678A1

  公开（公告）日：1988-04-27

  Die Erfindung betrifft ein Polyamid, das als Bindemittel für positiv arbeitende lichtempfindliche Gemische geeignet ist, und der Formel entspricht. Die mit diesem Bindemittel hergestellten positiv arbeitenden lichtempfindlichen Gemische zeigen eine hohe Lichtempfindlichkeit, eine gute Löslichkeit in den für die Herstellung für Photoresistgemische verwendeten Lösemitteln, sowie eine gute Haftfestigkeit auf dem Trägermaterial. Auch nach Lagerung des lichtempfindlichen Gemisches ist die Bildauflösung sehr hoch.

  本发明涉及一种聚酰胺，该聚酰胺可用作正作感光混合物的粘合剂，其结构式如 下：............. . 使用这种粘合剂生产的正向工作光敏混合物具有高光敏性、在生产光刻胶混合物所用溶剂中的良好溶解性以及与载体材料的良好粘附性。即使在光敏混合物储存之后，图像的分辨率也非常高。