Asymmetric bis-silanes and methods for making and their use
申请人:Dawes Steven B.
公开号:US20080207937A1
公开(公告)日:2008-08-28
An asymmetric bis-silane compound of the formula
A
3
Si—R
1
—SiB
3
where A, B, and R
1
are as defined herein, and to methods for making the bis-silane compound and their use to form layers or films of metal oxide particles, and which layers or films adhere to a suitable substrate. The materials and methods can be used, for example, to make photoactive devices.