1-Isopropyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪类
• 英文名称: 1-Isopropyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione
• 英文别名: N-isopropyl cyanuric acid；1-propan-2-yl-1,3,5-triazinane-2,4,6-trione
• 化学式: C₆H₉N₃O₃
• 分子量: 171.156
• InChiKey: UGKBGCHAJWVQTL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.2
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  78.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  羰基二异氰酸酯 、 1-苯基-3-(丙烷-2-基)脲 以 乙醚 、 二氯甲烷 为溶剂， 反应 12.0h， 以54%的产率得到1-Isopropyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione
  参考文献：
  名称：

  Akteries, Bernhard; Jochims, Johannes C., Chemische Berichte, 1986, vol. 119, # 2, p. 669 - 682

  摘要：

  DOI：

文献信息

• 5, 6-RING ANNULATED INDOLE DERIVATIVES AND USE THEREOF
  申请人：Bennett Frank

  公开号：US20100322901A1

  公开（公告）日：2010-12-23

  The present invention relates to 5,6-ring annulated indole derivatives of the formula (I), compositions comprising at least one 5,6-ring annulated indole derivatives, and methods of using the 5,6-ring annulated indole derivatives for treating or preventing a viral infection or a virus-related disorder in a patient.

  本发明涉及公式（I）的5,6-环接合吲哚衍生物，包含至少一种5,6-环接合吲哚衍生物的组合物，以及利用这些5,6-环接合吲哚衍生物治疗或预防患者病毒感染或与病毒相关的疾病的方法。
• ARYL-AND HETARYLSULFONAMIDES AS ACTIVE INGREDIENTS AGAINST ABIOTIC PLANT STRESS
  申请人：Frackenpohl Jens

  公开号：US20110230350A1

  公开（公告）日：2011-09-22

  Use of substituted sulfonamides of the formula (I) or salts thereof for enhancing stress tolerance in plants to abiotic stress, especially for enhancing plant growth and/or for increasing plant yield.

  使用式(I)的替代磺胺或其盐来增强植物对非生物胁迫的耐受性，特别是用于增强植物生长和/或增加植物产量。
• PHOTOCURABLE COMPOSITION, CURED OBJECT, AND PROCESS FOR PRODUCING THE SAME
  申请人：MITSUBISHI CHEMICAL CORPORATION

  公开号：EP1275668A1

  公开（公告）日：2003-01-15

  The present invention has an object of providing a photocurable composition which can form a cured product that exhibits an improved mechanical strength while maintaining inherent properties such as low birefringence and heat resistance, a cured product comprising the same, and a process for producing the same. In other words, the present invention lies in (1) a photocurable composition comprising the following components A, B and C (with the proviso that the proportion of the various components each are represented relative to 100 parts by weight of the sum of the weight of the components A and B); (2) a cured product obtained by the copolymerization of the photocurable composition in the presence of a radical polymerization initiator; and (3) a process for producing the cured product which comprises the copolymerization of the photocurable composition in the presence of a radical polymerization initiator: Component A: 70 to 99 parts by weight of an alicyclic skeleton-containing bis(meth)acrylate represented by the general formula (I): (wherein R1 and R2 each independently represent a hydrogen atom or methyl group; m represents 1 or 2; n represents 0 or 1; and p and q each independently represent 0, 1 or 2); Component B: 1 to 30 parts by weight of an alicyclic skeleton-containing mono(meth)acrylate represented by the general formula (II): (wherein R3 represents a hydrogen atom or methyl group; m represents 1 or 2; n represents 0 or 1; and r and s each independently represent 0, 1 or 2); and Component C: 1 to 10 parts by weight of a mercapto compound having a functionality of at least two.

  本发明的目的是提供一种光固化组合物，该组合物可以形成一种固化物，该固化物在保持低双折射和耐热性等固有特性的同时，显示出更高的机械强度。 换句话说，本发明在于：(1) 一种光固化组合物，该组合物由以下组分 A、B 和 C 组成（附带条件是，各组分的比例相对于组分 A 和 B 重量总和的 100 重量份）；(2) 在有自由基聚合引发剂存在的情况下，通过共聚光固化组合物而获得的固化产物；以及 (3) 生产固化产物的工艺，该工艺包括在有自由基聚合引发剂存在的情况下共聚光固化组合物： 组分 A：70 至 99 重量份的含脂环族骨架的双(甲基)丙烯酸酯，由通式(I)代表： (其中 R1 和 R2 各自独立地代表氢原子或甲基；m 代表 1 或 2；n 代表 0 或 1；p 和 q 各自独立地代表 0、1 或 2）； 组分 B：1 至 30 份（按重量计）由通式(II)代表的含脂环族骨架的单（甲基）丙烯酸酯： (其中 R3 代表氢原子或甲基；m 代表 1 或 2；n 代表 0 或 1；r 和 s 各自独立地代表 0、1 或 2）；以及 组分 C：1 至 10 重量份的巯基化合物，其官能度至少为 2。
• ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1757986A1

  公开（公告）日：2007-02-28

  There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.

  本发明提供了一种抗反射涂层成型组合物，该组合物由具有嘧啶三酮结构、咪唑烷二酮结构、咪唑烷三酮结构或三嗪三酮结构的聚合物和溶剂组成。由该组合物制得的防反射涂层对反射光有很好的防止效果，不会与光刻胶混合，并可在光刻工艺中使用 ArF 准分子激光束（波长 193 nm）或 F2 准分子激光束（波长 157 nm）等短波长光。
• SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1813987A1

  公开（公告）日：2007-08-01

  There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

  本发明提供了一种用于光刻的抗反射涂层形成组合物，该组合物由聚合物化合物、交联化合物、交联催化剂、磺酸盐化合物和溶剂组成。由该组合物制得的抗反射涂层对反射光有很好的防止效果，不会与光刻胶混合，与光刻胶相比具有更高的干蚀刻率，可以形成下部无基底的光刻胶图案，并可在光刻工艺中使用 ArF 准分子激光束和 F2 准分子激光束等光源。