A subject for the invention is to provide novel titanium complexes which have a high vapor pressure and high thermal stability and serve as an excellent material for producing a titanium-containing thin film by a technique such as the CVD method or ALD method and to further provide processes for producing these complexes, titanium-containing thin films produced from the complexes, and a process for producing the thin films. The invention relates to producing a titanium complex represented by general formula (1):
(wherein R
1
and R
4
each independently represent an alkyl group having 1-16 carbon atoms; R
2
and R
3
each independently represent a hydrogen atom or an alkyl group having 1-3 carbon atoms; and R
5
represents an alkyl group which has 1-16 carbon atoms and may have been substituted with one or more fluorine atoms) and to producing a titanium-containing thin film using the complex.
该发明的一个主题是提供具有高蒸气压和高热稳定性的新型
钛配合物,可作为通过CVD方法或ALD方法等技术生产含
钛薄膜的优质材料,并进一步提供生产这些配合物、由这些配合物产生的含
钛薄膜以及生产薄膜的工艺。该发明涉及生产由一般式(1)表示的
钛配合物:(其中R1和R4各自独立地表示具有1-16个碳原子的烷基基团;R2和R3各自独立地表示氢原子或具有1-3个碳原子的烷基基团;R5表示具有1-16个碳原子的烷基基团,可能已被一个或多个
氟原子取代),并使用该复合物生产含
钛薄膜。