2-[Bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)methyl]phenol | 154722-63-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 2-[Bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)methyl]phenol
• 英文别名: 2-cyclohexyl-4-[(5-cyclohexyl-4-hydroxy-2-methylphenyl)-(2-hydroxyphenyl)methyl]-5-methylphenol
• CAS: 154722-63-1
• 化学式: C₃₃H₄₀O₃
• 分子量: 484.7
• InChiKey: AFIAIUIEAKCWCD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  10
• 重原子数：
  36
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

文献信息

• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING
  申请人：DIC CORPORATION

  公开号：US20160177020A1

  公开（公告）日：2016-06-23

  There is provided a modified hydroxy naphthalene novolak resin optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I). In the formula, le is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group; m is 1 or 2; R 2 's each independently is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and a halogen atom; and at least one of the R 1 's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供了一种改性羟基萘酚诺伏酚树脂，最适用于具有高光学灵敏度、分辨率和碱性可开发性、以及出色的耐热性和吸湿性的光敏组合物和抗蚀材料，所述改性羟基萘酚诺伏酚树脂包括结构基团（I）。在公式中，le是氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种；m为1或2；R2各自独立地是氢原子、烷基、烷氧基、芳基、芳基烷基和卤素原子中的任意一种；并且树脂中存在的至少一个R1是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP0745575A1

  公开（公告）日：1996-12-04

  Provided are a method of synthesizing a highly pure polyphenol compound, which comprises (i) introducing at least one -CHRNR'R'' group onto aromatic ring(s) of a phenol compound having from one to ten aromatic ring(s), wherein R represents a hydrogen atom, an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'', which may be the same or different, each represents an alkyl group which may contain a hetero atom, a cycloalkyl group which may contain a hetero atom, an aralkyl group which may contain a hetero atom, or an aryl group, and R' and R'' may combine with each other to form a ring, (ii) converting the -CHRNR'R'' group into a -CHRA group via one to three steps, wherein A represents a hydroxyl group, an alkoxy group, an acyloxy group, a halogen atom, a quaternary ammonium salt or a sulfonyloxy group, and (iii) condensing the thus converted phenol compound and a phenol compound, and a positive working photoresist composition using the polyphenol compound obtained by the aforementioned method.

  本发明提供了一种合成高纯度多酚化合物的方法，该方法包括(i)在具有一至十个芳香环的苯酚化合物的芳香环上引入至少一个-CHRNR'R''基团，其中 R 代表氢原子、可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基、可含有杂原子的环烷基、可含有杂原子的芳烷基或芳基，R'和 R''可以相同或不同，各自代表可含有杂原子的烷基、可含有杂原子的环烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、可含有杂原子的芳烷基、(ii) 通过一至三个步骤将 -CHRNR'R'' 基团转化为 -CHRA 基团，其中 A 代表羟基、烷氧基、酰氧基、环烷基或芳基、烷氧基、酰氧基、卤素原子、季铵盐或磺酰氧基，以及 (iii) 将由此转化的苯酚化合物和苯酚化合物缩合，并使用通过上述方法获得的多酚化合物制备正性工作光刻胶组合物。
• Positive photoresist composition
  申请人：JSR Corporation

  公开号：EP0855620A1

  公开（公告）日：1998-07-29

  A positive photoresist composition including (A) 100 parts by weight of an alkali-soluble novolak resin, and based thereon; (B) 5 to 50 parts by weight of an alkali-soluble acrylic resin containing, as s, 10 to 80% by weight of a unit of a radical-polymerizable compound having an alcoholic hydroxyl group and 3 to 50% by weight of at least one of a unit of a radical-polymerizable compound having a carboxyl group and a unit of a radical-polymerizable compound having a phenolic hydroxyl group; (C) 5 to 100 parts by weight of a quinonediazide group-containing compound; and (D) a solvent, is provided. This composition has a good adhesion to substrates at the time of development and a good plating solution resistance and moreover can be well wetted with plating solutions, can be well developed with alkali developing solutions and can be well stripped from substrates at the resist unexposed areas, and is suited for the formation of thick films suitable as bump forming materials.

  一种正性光刻胶组合物，包括 (A) 100 份(重量)碱溶性酚醛树脂，并以其为基础；(B) 5 至 50 份（按重量计）碱溶性丙烯酸树脂，其中含有 10 至 80% （按重量计）具有醇羟基的可自由基聚合的化合物单元，以及 3 至 50% （按重量计）具有羧基的可自由基聚合的化合物单元和具有酚羟基的可自由基聚合的化合物单元中的至少一种； (C) 5 至 100 份（按重量计）含醌噻嗪基的化合物；以及 (D) 溶剂。这种组合物在显影时对基底具有良好的附着力和良好的耐电镀溶液性，而且可以很好地润湿电镀溶液，可以很好地用碱性显影液显影，可以很好地从基底的抗蚀剂未暴露区域剥离，适合形成适合作为凸点形成材料的厚膜。