申请人:JAPAN SYNTHETIC RUBBER CO., LTD.
公开号:EP0594452A2
公开(公告)日:1994-04-27
A radiation sensitive resin composition for microlens comprising (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, (c) a compound having at least 2 epoxy groups in the molecule, (d) a melamine and (e) a trihalomethyltriazine or an onium salt, which composition exhibits high sensitivity, high resolution and high yield of residual film thickness in the formation of a lens pattern and is small in dependency on heating conditions in the preparation of a microlens.
一种用于微透镜的辐射敏感树脂组合物,包括 (a) 碱溶性树脂,(b) 1,2-quinonediazide 化合物,(c) 分子中至少有 2 个环氧基团的化合物,(d) 三聚氰胺和 (e) 三卤甲基三嗪或鎓盐,该组合物在透镜图案形成过程中具有高灵敏度、高分辨率和高残余膜厚产量,并且在制备微透镜时对加热条件的依赖性小。