申请人:DOW GLOBAL TECHNOLOGIES LLC
公开号:US20150025278A1
公开(公告)日:2015-01-22
A polymer includes repeat units having the structure
wherein R
1
, R
2
, Ar
1
, Ar
2
, and Ar
3
are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists.
一种聚合物包括重复单元,其结构为其中R1,R2,Ar1,Ar2和Ar3如本文所定义。该聚合物可以通过铃木缩合反应制备。聚合物主链中的缩醛和/或缩酮官能团使得主链在酸性环境下可被断裂。该聚合物在包括光刻胶在内的应用中具有用途。