methyldiglycidyl-triazinetrione | 69804-58-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪类
• 英文名称: methyldiglycidyl-triazinetrione
• 英文别名: 1,3,5-Triazine-2,4,6(1H,3H,5H)-trione, 1-methyl-3,5-bis(oxiranylmethyl)-；1-methyl-3,5-bis(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione
• CAS: 69804-58-6
• 化学式: C₁₀H₁₃N₃O₅
• 分子量: 255.23
• InChiKey: KQEJGXLRINKCST-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.2
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  86
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  monomethylisocyanuric acid 、 环氧氯丙烷 以78%的产率得到methyldiglycidyl-triazinetrione
  参考文献：
  名称：

  Fischer; Zeidler; Budnowski, Arzneimittel-Forschung/Drug Research, 1984, vol. 34, # 5, p. 543 - 547

  摘要：

  DOI：

文献信息

• COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20190163063A1

  公开（公告）日：2019-05-30

  A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R 1 is a methyl group or an ethyl group, and R 2 and R 3 are independently a hydrogen atom, a C 1-4 alkyl group, or phenyl group.

  一种用于形成抗蚀底层膜的组合物具有良好的常温储存稳定性。一种用于光刻的抗蚀底层膜的组合物包括具有以下式(1)中的2至6个取代基的含氮化合物，一种聚合物，一种促进交联反应的化合物和一种有机溶剂。其中，具有式(1A)的甘氨酰脲衍生物的每个R1是甲基基团或乙基基团，而R2和R3分别是氢原子、C1-4烷基或苯基。
• COMPOSITION FOR FORMING HIGHLY ADHESIVE RESIST UNDERLAYER FILM
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD

  公开号：US20150031206A1

  公开（公告）日：2015-01-29

  A composition for forming a resist underlayer film for lithography, including a polymer having a repeating structural unit of Formula (1): R 1 is a hydrogen atom or a methyl group and Q 1 is a group of Formula (2) or Formula (3): (wherein R 2 , R 3 , R 5 , and R 6 are independently a hydrogen atom or a linear or branched hydrocarbon group having a carbon atom number of 1 to 4, R 4 is a hydrogen atom or a methyl group, R 7 is a linear or branched hydrocarbon group having a carbon atom number of 1 to 6, a C 1-4 alkoxy group, a C 1-4 alkylthio group, a halogen atom, a cyano group, or a nitro group, w 1 is an integer of 0 to 3, w 2 is an integer of 0 to 2, and x is an integer of 0 to 3), and v 1 and v 2 are independently 0 or 1; and an organic solvent.

  一种用于光刻的阻抗下层膜的组合物，包括具有重复结构单元公式（1）的聚合物：其中R1是氢原子或甲基基团，Q1是公式（2）或公式（3）的基团：（其中R2、R3、R5和R6分别是具有1至4个碳原子的线性或支链烃基或氢原子，R4是氢原子或甲基基团，R7是具有1至6个碳原子的线性或支链烃基、C1-4烷氧基、C1-4烷硫基、卤素原子、氰基或硝基，w1为0至3的整数，w2为0至2的整数，x为0至3的整数），以及有机溶剂。
• RESIST UNDERLAYER FILM-FORMING COMPOSITION
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20150087155A1

  公开（公告）日：2015-03-26

  A composition forms a resist underlayer film showing improved adhesiveness to a resist pattern. A resist underlayer film-forming composition for lithography, including: a polymer that has a structure of Formula (1a), Formula (1b), or Formula (2) below on an end of the polymer; and an organic solvent: (where R 1 is a hydrogen atom or a methyl group; each of R 2 and R 3 is independently a hydrogen atom or an organic group such as a hydrocarbon group, etc., the hydrocarbon group optionally has at least one of a hydroxy group and a methylthio group as substituent(s); R 4 is a hydrogen atom or a hydroxy group; Q 1 is an arylene group; v is 0 or 1; y is an integer of 1 to 4; w is an integer of 1 to 4; x 1 is 0 or 1; and x 2 is an integer of 1 to 5).

  一种组成物形成抗蚀底层膜，显示出对抗蚀图案改进的粘附性。一种用于光刻的抗蚀底层膜形成组合物，包括：具有以下公式（1a）、公式（1b）或公式（2）结构的聚合物，其位于聚合物的一端；以及有机溶剂：（其中R1是氢原子或甲基基团；R2和R3各自独立地是氢原子或有机基团，例如烃基团等，烃基团可选地具有至少一个羟基和一个甲硫基作为取代基；R4是氢原子或羟基；Q1是芳基烃基团；v为0或1；y为1到4的整数；w为1到4的整数；x1为0或1；x2为1到5的整数）。
• CURABLE COMPOSITION, CURED PRODUCT, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20220177641A1

  公开（公告）日：2022-06-09

  a curable composition that gives a cured product exhibiting a high refractive index and a surface without defects such as roughness or cracks, a cured product of the composition, and a compound that may be blended to the composition. In a curable composition including a triazine compound having three aromatic-ring-containing groups each bonded to the triazine ring via an amino group, an aromatic-ring-containing group having a specific structure having a radically polymerizable group-containing group or a cationically polymerizable group-containing group is used as at least one of the three aromatic-ring-containing groups bonded to the triazine ring in the triazine compound mentioned above.

  一种可治愈的组合物，可产生具有高折射率和表面无缺陷（如粗糙或裂纹）的固化产品，该组合物的固化产品以及可混合到该组合物中的化合物。在包括三嗪化合物的可固化组合物中，每个含有芳香环的基团均通过氨基与三嗪环结合，具有特定结构的含芳香环基团具有具有自由基聚合基团或阴离子聚合基团的群组，至少用作上述三嗪化合物中与三嗪环结合的三个芳香环含基团之一。
• COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1560070A1

  公开（公告）日：2005-08-03

  There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.

  本发明提供了一种用于形成防反射涂层的组合物，该组合物对用于制造半导体器件的波长的光具有良好的吸收性，对光的反射具有较高的保护效果，与光刻胶层相比具有较高的干蚀刻率。具体来说，用于形成抗反射涂层的组合物含有一种三嗪三酮化合物、低聚物化合物或聚合物化合物，其氮原子上的取代基为羟烷基结构。