triazinetriethanol | 20922-84-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪类
• 英文名称: triazinetriethanol
• 英文别名: 2,4,6-Tris-(β-hydroxy-ethyl)-sym.-triazin；2,2',2''-[1,3,5]triazine-2,4,6-triyl-tris-ethanol；2,2',2''-(1,3,5-Triazine-2,4,6-triyl)tri(ethan-1-ol)；2-[4,6-bis(2-hydroxyethyl)-1,3,5-triazin-2-yl]ethanol
• CAS: 20922-84-3
• 化学式: C₉H₁₅N₃O₃
• 分子量: 213.236
• InChiKey: SMYKEPIOLOZRSO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.2
• 重原子数：
  15
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  99.4
• 氢给体数：
  3
• 氢受体数：
  6

文献信息

• Halogen-free flame retardant polyester
  申请人：Wit De Gerrit

  公开号：US20060074155A1

  公开（公告）日：2006-04-06

  Novel polyester composition comprising a polyester, wherein said polyester comprises structural units derived from substituted or unsubstituted diacid or diester, a substituted or unsubstituted diol; a phosphorus containing compound and at least one selected from a stabilizer and an organic compound comprising at least one functional group is been disclosed. In addition methods for the preparation of the polyester composition and articles derived from said composition is disclosed.

  本发明涉及一种新型聚酯组合物，包括聚酯和以下组分：由取代或未取代的二酸或二酯衍生的结构单元，取代或未取代的二元醇，含磷化合物以及至少选择自稳定剂和含有至少一个官能团的有机化合物之一。此外，本发明还涉及制备该聚酯组合物的方法以及从该组合物衍生的物品。
• HEXAHYDROTRIAZINES, SYNTHESIS AND USE
  申请人：Kaplan Gregory

  公开号：US20130118996A1

  公开（公告）日：2013-05-16

  Methods for making asymmetrical triazines are provided. The methods comprise first forming a mixture of at least two primary amines then reacting the mixture with an aldehyde. Methods for removing sulfides from hydrocarbon streams are also provided. The triazines may be added to the hydrocarbon stream in a molar ratio of triazine:H 2 S of about 10:1 to about 1:2.

  本文提供了制备非对称三嗪的方法。该方法包括首先形成至少两种主要胺的混合物，然后将混合物与醛反应。本文还提供了从烃流中去除硫化物的方法。三嗪可以以三嗪：H2S的摩尔比约为10:1至约1:2的比例添加到烃流中。
• Synthesis of oxyalkylated polyamino-1,3,5-triazines
  申请人：AMERICAN CYANAMID COMPANY

  公开号：EP0051734A1

  公开（公告）日：1982-05-19

  A process for synthesizing oxyalkylated polyamino-1,3,5-triazines involving reacting a hydroxyalkyl (C2- C12) or hydroxyaryl polyamino-1,3,5-triazine with an alkylene oxide at an elevated temperature in the substantial absence of a solvent.

  一种合成氧烷基化聚氨基-1,3,5-三嗪的工艺，包括在基本上无溶剂的情况下，在高温下使羟烷基（C2- C12）或羟芳基聚氨基-1,3,5-三嗪与环氧烷反应。
• Aqueous dispersion with fungicidal and algicidal action
  申请人：Air Liquide Santé (International)

  公开号：EP1389424A1

  公开（公告）日：2004-02-18

  The invention relates to a preservative with algicidal and fungicidal action in the form of a dispersion which includes a) at least one algicidal triazine, b) at least one fungicidal isothiazolone and c) at least one dispersion stabilizer chosen from the group consisting of c1) sulphite salt, hydrogen sulphite salt, compound which releases sulphite and compound which releases hydrogen sulphite, and c2) hypophosphite salt and compound which releases hypophosphite salt; and to the use of the preservative in an aqueous dispersion for use in or on technical products for internal or external application.

  本发明涉及一种分散体形式的具有杀藻和杀菌作用的防腐剂，其中包括 a) 至少一种杀藻三嗪、 b) 至少一种杀真菌的异噻唑啉酮和 c) 至少一种分散稳定剂，选自以下组别 c1) 亚硫酸盐、亚硫酸氢盐、释放亚硫酸盐的化合物和释放亚硫酸氢盐的化合物，以及 c2) 次亚磷酸酯盐和释放次亚磷酸酯盐的化合物； 以及防腐剂在水分散液中的使用，用于内部或外部应用的技术产品中或产品上。
• COMPOSITION FOR ANTIREFLECTION FILM FORMATION
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1542075A1

  公开（公告）日：2005-06-15

  There is provided a composition for forming anti-reflective coating containing a urea compound substituted by hydroxyalkyl group or alkoxyalkyl group, and preferably a light absorbing compound and/or a light absorbing resin; a method of forming a anti-reflective coating for a semiconductor device by use of the composition; and a process for manufacturing a semiconductor device by use of the composition. The composition according to the present invention exhibits a good light-absorption to a light having a wavelength used for manufacturing a semiconductor device. Therefore, the composition exerts a high protection effect against light reflection, and has a high dry etching rate compared with photoresist layers.

  本发明提供了一种用于形成抗反射涂层的组合物，该组合物含有被羟烷基或烷氧基烷基取代的脲化合物，最好还含有光吸收化合物和/或光吸收树脂；一种通过使用该组合物形成半导体器件抗反射涂层的方法；以及一种通过使用该组合物制造半导体器件的工艺。根据本发明的组合物对具有用于制造半导体器件的波长的光具有良好的光吸收性。因此，与光刻胶层相比，本发明的组合物具有较高的光反射保护效果和干蚀刻率。